Thermal analysis of diamondlike carbon membrane masks in projection electron-beam lithography

Babin, S.; Butomo, V.; Kuzmin, Igor Yu.; Yamashita, Hiroshi; Yamabe, Masaki

doi:10.1116/1.1826059

Cited by 2 publications

(1 citation statement)

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“…1). 10 The limiting aperture thus plays an important role in membrane mask use, and its limiting angle is set to several mrad to obtain high contrast on the wafer. As mentioned above, two types of EPL mask can create scattering contrast: the stencil mask and the membrane mask.…”

Section: Electron Optics and Scattering Masksmentioning

confidence: 99%

Lithographic performance of diamond-like carbon membrane mask in electron projection lithography

Yamashita¹,

Amemiya

Yamabe³

et al. 2004

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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We have studied the lithographic performance of high-performance diamond-like carbon (DLC) membrane masks by demonstrating exposure experiments using Nikon's electron beam stepper, NSR-EB1A. We estimated the inelastic mean free path of 100 keV electrons in a membrane analytically using the measurement results of zero-loss electron transmittance and found it to be about 50 nm. We then used this value to find the relationship between membrane thickness and zero-loss electron transmittance. The resolution for high-performance membrane masks is equivalent to that of a stencil mask and was not deteriorated by chromatic aberration due to inelastic electron scattering. Electrons undergoing inelastic scattering did not appear to affect resolution. The nominal exposure dose was proportional to the inverse of zero-loss electron transmittance. We also discussed the optimum membrane thickness in terms of throughput and electron inelastic scattering, focusing on plasmon excitation.

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Section: Electron Optics and Scattering Masksmentioning

confidence: 99%