2013
DOI: 10.1016/j.nimb.2012.11.002
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Thermal and radiation process for nano-/micro-fabrication of crosslinked PTFE

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Cited by 5 publications
(4 citation statements)
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“…However, micro- and nanopatterning of Teflon AF poses a considerable challenge. Currently available techniques for micropatterning of Teflon AF are mostly based on focused ion beam etching, synchrotron radiation, and laser light exposure, which are limited to micrometer resolution. Common photolithography has also been reported as an alternative, allowing for micropatterning of Teflon AF surfaces with the smallest feature size of ∼1 μm …”
mentioning
confidence: 99%
“…However, micro- and nanopatterning of Teflon AF poses a considerable challenge. Currently available techniques for micropatterning of Teflon AF are mostly based on focused ion beam etching, synchrotron radiation, and laser light exposure, which are limited to micrometer resolution. Common photolithography has also been reported as an alternative, allowing for micropatterning of Teflon AF surfaces with the smallest feature size of ∼1 μm …”
mentioning
confidence: 99%
“…In this study, electron beam-nanoimprint lithography (EB-NIL), which enables cross-linking and device fabrication at the same time, 8,9) was proposed as a novel method for fabricating micro-/nanostructures of RX-PLLA. The fabrication accuracy was evaluated by estimating the line edge roughness (LER), and the thermal resistance of these structures was evaluated by measuring the deformation after heating in order to apply bio-MEMS/NEMS.…”
mentioning
confidence: 99%
“…Furthermore, heat-shrinkable Quantum Beam Sci. 2020, 4, 14 2 of 13 tube, foamed polyethylene [7,8], high-purity ceramic fiber [9], fluorine polymer materials [10,11], and others [12][13][14] have been developed for practical use.…”
Section: Introductionmentioning
confidence: 99%