2015
DOI: 10.1016/j.actamat.2014.12.022
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Thermal oxidation of amorphous Al0.44Zr0.56 alloys

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Cited by 43 publications
(23 citation statements)
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“…After the oxidation, the quartz ampoules were immediately quenched in water (T $ 18°C), which promptly terminated the oxidation process. The grown oxide layers have thicknesses in the range of 4 nm to 160 nm (as determined by spectroscopic ellipsometric (SE) investigations, see [15]), depending on T ox , t ox and the parent alloy composition.…”
Section: Oxidation Of Am-al X Zr 1àx Alloysmentioning
confidence: 99%
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“…After the oxidation, the quartz ampoules were immediately quenched in water (T $ 18°C), which promptly terminated the oxidation process. The grown oxide layers have thicknesses in the range of 4 nm to 160 nm (as determined by spectroscopic ellipsometric (SE) investigations, see [15]), depending on T ox , t ox and the parent alloy composition.…”
Section: Oxidation Of Am-al X Zr 1àx Alloysmentioning
confidence: 99%
“…Conversion of the sputter time to the (approximate) sputter depth was done straightforwardly for each sputter-depth profile on the basis of the known oxide-layer thickness as obtained from the SE investigations [15].…”
Section: Structural and Compositional Characterizationmentioning
confidence: 99%
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“…The composition of the deposited Al x Zr 1Àx solid solutions was determined by comparing the measured AES intensities with AES intensities of homogeneous amorphous Al x Zr 1Àx solid solutions prepared under similar conditions with known concentration, as determined by inductively coupled plasma optical emission spectrometry (for details, see Refs. [47][48][49]. The concentrations of the Zr-rich layers are either x Al ¼ 27 at.…”
Section: Experimental Procedures a Specimen Preparationmentioning
confidence: 99%