2020
DOI: 10.1063/5.0016496
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Thermal properties of cubic GaN/GaAs heterostructures grown by molecular beam epitaxy

Abstract: Cubic GaN/GaAs (001) heterostructures were grown by RF-plasma assisted molecular beam epitaxy with different GaN nucleation temperatures. The heterostructures were studied by an open cell configuration of a photoacoustic experiment to obtain the effective thermal diffusivity (α) of the composite, which presented values varying from 14 to 28mm2/s. Also, a two-layer model was used in order to obtain the interfacial thermal conductivity (η), revealing values from 5 to 35W/cm2 K. Both α and η presented higher valu… Show more

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Cited by 4 publications
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“…The wurtzite phase of gallium nitride ( w -GaN), the ground state of bulk-GaN, is crucial for blue LED devices. However, its large built-in polarization in [0001̅] direction and low hole dopability hamper the light-emitting efficiency of a GaN blue LED. While several nonpolar phases of GaN have been proposed to overcome such obstacles, , haeckelite GaN (4|8-GaN) emerges as a promising material for optoelectronics applications. 4|8-GaN is nonpolar and, thermally, the most stable phase when material is atomically thin (2–18 GaN atomic layers). ,, Thus, 4|8-GaN is a promising material for nanophotoinc applications and can be fabricated, for example, by epitaxial growth on a graphene buffer layer under strain free conditions. …”
Section: Introductionmentioning
confidence: 99%
“…The wurtzite phase of gallium nitride ( w -GaN), the ground state of bulk-GaN, is crucial for blue LED devices. However, its large built-in polarization in [0001̅] direction and low hole dopability hamper the light-emitting efficiency of a GaN blue LED. While several nonpolar phases of GaN have been proposed to overcome such obstacles, , haeckelite GaN (4|8-GaN) emerges as a promising material for optoelectronics applications. 4|8-GaN is nonpolar and, thermally, the most stable phase when material is atomically thin (2–18 GaN atomic layers). ,, Thus, 4|8-GaN is a promising material for nanophotoinc applications and can be fabricated, for example, by epitaxial growth on a graphene buffer layer under strain free conditions. …”
Section: Introductionmentioning
confidence: 99%