Thermal roll to roll nanoimprint lithography for micropillars fabrication on thermoplastics

Retolaza, A.; Juarros, A.; Ramiro, J.; Merino, S.

doi:10.1016/j.mee.2018.02.026

Cited by 15 publications

(10 citation statements)

References 16 publications

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“…Concerning large scale production of antireflective textures, roll to roll (R2R) nanoimprint lithography is a well suited technology due to its high throughput and nano scale resolution 13 . Thermal R2R-NIL has been applied for the fabrication of functional nano and micro structures on flexible films, based on thermoplastic polymers such as polycarbonate, cellulose acetate or PMMA 14 – 16 . Nonetheless, up to date, thermal R2R-NIL has not been employed to produce moth-eye AR surfaces on thermoplastic films.…”

Section: Introductionmentioning

confidence: 99%

Bioinspired antireflective flexible films with optimized mechanical resistance fabricated by roll to roll thermal nanoimprint

Jacobo-Martín

Rueda

Hernández

et al. 2021

Sci Rep

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This work describes the fabrication process of moth eye antireflective poly (methyl methacrylate) transparent films via roll to roll thermal nanoimprint lithography. The process parameters are investigated and adjusted in order to obtain from a single moth-eye structured mold, a range of antireflective topographies that gradually vary their geometry from protruding to intruding nanocones. A correlation between the process parameters with the optical and mechanical properties of the films is established to illustrate the influence of the processing parameters and serve as guideline to produce antireflective flexible films with balanced properties and optimized performance adequate to the application environment. A finite element model is described predicting the mechanical behavior of the moth-eye PMMA imprinted nanostructures.

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Section: Introductionmentioning

confidence: 99%

Bioinspired antireflective flexible films with optimized mechanical resistance fabricated by roll to roll thermal nanoimprint

Jacobo-Martín

Rueda

Hernández

et al. 2021

Sci Rep

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“…When the local maximum a (n, 1) is less than the smallest threshold ξ a, m , k p(n) equals k p, max . The changes in k p can be described by (10) …”

Section: Piecewise Linear Weighted (Plw) Iterative Algorithmmentioning

confidence: 99%

“…Periodic micro/nanostructures have numerous applications, such as photonic crystals [1], liquid crystal displays [2], solar cells [3,4], high density data storage [5,6], and biosensors [7,8]. A number of technologies have been utilized to fabricate periodic structures, including interference lithography [9], nanoimprinting [10,11], electron beam lithography [12,13], focused ion beam etching [14], and direct laser writing [15][16][17]. These commonly used techniques are difficult to produce large area micro/nanostructures with diameters of several hundred millimeters.…”

Section: Introductionmentioning

confidence: 99%

Piecewise Linear Weighted Iterative Algorithm for Beam Alignment in Scanning Beam Interference Lithography

Song

Bayanheshig

et al. 2019

Photonic Sens

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To obtain a good interference fringe contrast and high fidelity, an automated beam iterative alignment is achieved in scanning beam interference lithography (SBIL). To solve the problem of alignment failure caused by a large beam angle (or position) overshoot exceeding the detector range while also speeding up the convergence, a weighted iterative algorithm using a weight parameter that is changed linearly piecewise is proposed. The changes in the beam angle and position deviation during the alignment process based on different iterative algorithms are compared by experiment and simulation. The results show that the proposed iterative algorithm can be used to suppress the beam angle (or position) overshoot, avoiding alignment failure caused by over-ranging. In addition, the convergence speed can be effectively increased. The algorithm proposed can optimize the beam alignment process in SBIL.

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“…One alternative which has been proposed for resolving this problem is nano imprinting. This is a mechanical etching method in which a polymer substrate is softened by heating it to higher than the glass transition temperature [7][8][9][10][11][12][13][14] and then a stamp with a nano-shape is pressed on the surface to transfer the opposite shape [15][16][17]. This manufacturing method is classified according to the method by which the resin is hardened, and it includes the photocuring method which uses ultraviolet radiation on the resin and the TH-NIL method which cools the resin to harden it.…”

Section: Introductionmentioning

confidence: 99%

Experimental and Numerical Study on the Characteristics of the Thermal Design of a Large-Area Hot Plate for Nanoimprint Equipment

Park¹,

Lee

2019

Sustainability

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A numerical study was conducted on the thermal performance of a large-area hot plate specifically designed as a heating and cooling tool for thermal nanoimprint lithography processes. The hot plate had the dimensions 240 mm × 240 mm × 20 mm, in which a series of cartridge heaters and cooling holes were installed. Stainless steel was selected to endure the high molding pressures. To examine the hot plate’s abnormal thermal behavior, ANSYS Fluent V15.0, which is commercial CFD code, was used to perform computational analysis. A numerical model was employed to predict the thermal behavior of the hot plate in both the heating and cooling phases. To conduct the thermal design of a large-area hot plate for nanoimprint equipment, we selected the model to be studied and proposed a cooling model using both direct and indirect cooling methods with and without heat pipes. In addition, we created a small hot plate and performed experimental and computational analyses to confirm the validity of the proposed model. This study also analyzed problems that may occur in the stage prior to the large-area expansion of the hot plate. In the case of a stainless steel (STS304) hot plate for large-area hot plate expansion, the heat pipes were inserted in the direction of the cartridge heaters to address the problems that may occur when expanding the hot plate into a large area. As a result, the heating rate was 40 °C/min and the temperature uniformity was less than 1% of the maximum working temperature of 200 °C. For cooling, when considering pressure and using air as the coolant for the ends, a cooling rate of 20 °C/min and thermal performance of less than 13.2 °C (less than 7%) based on the maximum temperature were obtained. These results were similar to the experimental results.

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Thermal roll to roll nanoimprint lithography for micropillars fabrication on thermoplastics

Cited by 15 publications

References 16 publications

Bioinspired antireflective flexible films with optimized mechanical resistance fabricated by roll to roll thermal nanoimprint

Bioinspired antireflective flexible films with optimized mechanical resistance fabricated by roll to roll thermal nanoimprint

Piecewise Linear Weighted Iterative Algorithm for Beam Alignment in Scanning Beam Interference Lithography

Experimental and Numerical Study on the Characteristics of the Thermal Design of a Large-Area Hot Plate for Nanoimprint Equipment

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