Thermal Stability of Hydroxyl Groups on a Well-Defined Silica Surface

Sneh, Ofer; George, Steven M.

doi:10.1021/j100013a039

Cited by 208 publications

(185 citation statements)

References 9 publications

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“…It is well documented that the addition of silica in metal oxides can stabilize the nanocrystal and enhance their catalytic activity [28,29]. Moreover, according to the paper reported by George et al [30], the silica surface is terminated by lots of hydroxyl groups at the atmospheric pressure and temperatures below 150 o C, and the hydroxyl groups have extraordinary ability of water absorption [31]. Therefore, at room temperature, ammonia molecules will be adsorbed and react with water molecules on the surface of silica modified CeO2 to produce NH4 + and OH -ions.…”

Section: Introductionmentioning

confidence: 95%

Enhanced NH3 gas-sensing performance of silica modified CeO2 nanostructure based sensors

Wang

Zhang

et al. 2018

Sensors and Actuators B: Chemical

155

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Northumbria University has developed Northumbria Research Link (NRL) to enable users to access the University's research output. Copyright © and moral rights for items on NRL are retained by the individual author(s) and/or other copyright owners. Single copies of full items can be reproduced, displayed or performed, and given to third parties in any format or medium for personal research or study, educational, or not-for-profit purposes without prior permission or charge, provided the authors, title and full bibliographic details are given, as well as a hyperlink and/or URL to the original metadata page. The content must not be changed in any way. Full items must not be sold commercially in any format or medium without formal permission of the copyright holder. The full policy is available online: http://nrl.northumbria.ac.uk/policies.html This document may differ from the final, published version of the research and has been made available online in accordance with publisher policies. To read and/or cite from the published version of the research, please visit the publisher's website (a subscription may be required.) This is a PDF file of an unedited manuscript that has been accepted for publication. As a service to our customers we are providing this early version of the manuscript. The manuscript will undergo copyediting, typesetting, and review of the resulting proof before it is published in its final form. Please note that during the production process errors may be discovered which could affect the content, and all legal disclaimers that apply to the journal pertain. Accepted Manuscript Highlights The silica modified CeO2 nanostructures are synthesized using a sol-hydrothermal route and used as NH3 gas-sensing materials. At room temperature, the 8%silica-CeO2 based gas sensor shows high gas response of 3244% to 80 ppm of NH3 and lower detection limit (0.5 ppm) towards NH3 gas. The gas response of the NH3 sensor has good linear characteristics for NH3 gas detecting. The NH3 sensor exhibits good reproducibility, selectivity and long-term stability to NH3 gas. AbstractThe silica modified CeO2 gas sensing nanomaterials are synthesized using a sol-hydrothermal route. The 8%silica-CeO2 has larger specific surface areas of 83.75 m 2 /g and smaller crystalline size of 11.5 nm than pure CeO2, respectively. Compared to pure CeO2, the 8%silica-CeO2 based gas sensor exhibits significant enhancement 2 NH3 gas-sensing performance. At room temperature, it shows much better gas response of 3244% to 80 ppm of NH3 gas and lower detection limit (0.5 ppm) towards NH3 gas. It is also found that the gas response of the NH3 gas sensors increases linearly with the increase of NH3 gas concentration. Moreover, the NH3 gas sensor have good reversibility, stability and selectivity. The reason of enhanced NH3gas-sensing performance is not only because of the increased specific surface areas, but also due to the electrolytic conductivity of NH4 + and OH -on the surface.

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Section: Introductionmentioning

confidence: 95%

Enhanced NH3 gas-sensing performance of silica modified CeO2 nanostructure based sensors

Wang

Zhang

et al. 2018

Sensors and Actuators B: Chemical

155

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“…37,38,39 Silanol sites are active centers for water absorption, so that the SiO 2 surface becomes hydrated under normal conditions, 40 which is probably the case of most of the graphene samples produced by mechanical cleavage. 8 Moreover, several layers of water may cover the SiO 2 surface, lying between the oxide surface and the graphene samples after the graphene deposition.…”

Section: Layer Of Water Moleculesmentioning

confidence: 99%

Electrostatic interactions between graphene layers and their environment

Sabio

Seoanez²,

Fratini³

et al. 2008

Phys. Rev. B

127

115

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We analyze the electrostatic interactions between a single graphene layer and a SiO2 susbtrate, and other materials which may exist in its environment. We obtain that the leading effects arise from the polar modes at the SiO2 surface, and water molecules, which may form layers between the graphene sheet and the substrate. The strength of the interactions implies that graphene is pinned to the substrate at distances greater than a few lattice spacings. The implications for graphene nanoelectromechanical systems, and for the interaction between graphene and a STM tip are also considered.

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“…Isolated hydrogen can survive the annealing at temperatures over 1,000°C, presumably, because it needs to find another hydrogen to be removed as H 2 or even H 2 O. 10 As the concentration of hydrogen at the film surface is reduced by annealing, this becomes increasingly improbable. Systems operating on these devices cannot operate in these wavelengths.…”

Section: Resultsmentioning

confidence: 99%

Plasma-enhanced chemical-vapor deposition oxide prepared at low-flow conditions for course wavelength-division multiplexing optical-waveguide devices

Chu

Lin

Wang³

et al. 2003

Journal of Elec Materi

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Silicon oxide (SiO x ) films grown by plasma-enhanced chemical-vapor deposition (PECVD) were investigated for applications in a course wavelength-division multiplexing (CWDM) network. The SiO x films were deposited on 4-in. silicon wafers based on the reaction of N 2 O/SiH 4 precursors. After postdeposition annealing at 1,150°C, the transmission spectra of the films prepared at different flow rates of the precursor were compared. We found that the transmission spectrum of the films deposited at the low-flow conditions can be flattened to a ripple of less than 0.5 dB ranging from visible up to 1,470 nm. In addition, the material losses at wavelengths around 1,500 nm caused by absorption of Si-H and N-H bonds were significantly reduced.

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Thermal Stability of Hydroxyl Groups on a Well-Defined Silica Surface

Cited by 208 publications

References 9 publications

Enhanced NH3 gas-sensing performance of silica modified CeO2 nanostructure based sensors

Enhanced NH3 gas-sensing performance of silica modified CeO2 nanostructure based sensors

Electrostatic interactions between graphene layers and their environment

Plasma-enhanced chemical-vapor deposition oxide prepared at low-flow conditions for course wavelength-division multiplexing optical-waveguide devices

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