2002
DOI: 10.1002/1521-396x(200211)194:1<192::aid-pssa192>3.0.co;2-l
|View full text |Cite
|
Sign up to set email alerts
|

Thermal Stability of Lead Oxide Films Prepared by Reactive DC Magnetron Sputtering

Abstract: The thermal stability of different lead oxide films prepared by reactive dc magnetron sputtering from a Pb target has been investigated. The temperature dependence of composition as well as structural and optical properties have been studied by Rutherford backscattering spectroscopy (RBS), X‐ray diffraction (XRD) and variable‐angle spectroscopic ellipsometry (VASE). Both XRD and RBS experiments confirm that different kinds of lead oxides are formed upon increasing the oxygen flow. Upon annealing at 500 °C, all… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
7
0

Year Published

2005
2005
2021
2021

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 15 publications
(7 citation statements)
references
References 14 publications
0
7
0
Order By: Relevance
“…This specific structure has been realized due to the peculiarities of the fabrication method: the oxidation takes place at an early stage of aggregation close to the sputtered metal surface where dissociated, ionized, and excited oxygen is most abundant. Reactive magnetron sputtering with subsequent deposition of the oxide molecules is a well-established technique for producing metal oxide thin films (e.g., see ref 23) and was recently used also for gold oxide films. 24 In our apparatus the magnetron is placed inside a liquid-nitrogen-cooled cryostat, and the aggregation path inside it is about 20 cm long.…”
Section: Methodsmentioning
confidence: 99%
“…This specific structure has been realized due to the peculiarities of the fabrication method: the oxidation takes place at an early stage of aggregation close to the sputtered metal surface where dissociated, ionized, and excited oxygen is most abundant. Reactive magnetron sputtering with subsequent deposition of the oxide molecules is a well-established technique for producing metal oxide thin films (e.g., see ref 23) and was recently used also for gold oxide films. 24 In our apparatus the magnetron is placed inside a liquid-nitrogen-cooled cryostat, and the aggregation path inside it is about 20 cm long.…”
Section: Methodsmentioning
confidence: 99%
“…The extinction coefficient of the photocatalysis is eventually determined. Several research groups have successfully used this model to derive the optical properties of the oxide films and more details can be found in the literature [14][15][16].…”
Section: Characterization Of Photocatalystsmentioning
confidence: 99%
“…In the steady state, there remains a mixture of PbO and PbO 2 in the oxide layer of the Pb target. The fluctuation in oxygen flow to the Pb target changes the proportion of two oxides, PbO and PbO 2 [26]. Although, the slight variation in Pb spectral line intensity does not affect the overall Pb content in the PZT film, thanks to Pb-stabilization effect [27].…”
Section: Co-sputtering Three Targetsmentioning
confidence: 99%