2009
DOI: 10.1002/adem.200800354
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Thermal Stability of W‐xRe/TiC/SiC Systems = 0, 5 and 25 at % Re) at High Temperature

Abstract: To ensure the integrity and sustainability of high‐temperature applications, the development of protective materials is actually one of the major challenge in materials science. In our study, we examined the effect of a TiC film interlayered between W‐xRe (x = 0, 5 or 25 at % Re) and SiC. The protection given by TiC layer was considered in the 1573–1873 K temperature range and for TiC thicknesses up to about 100 μm.

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Cited by 7 publications
(6 citation statements)
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“…Annealing experiment was conducted with the designed functionally graded materials which embedding the Ti layer between SiC and W-25Re alloy were annealed using the same experimental conditions. Although there were some previous researches with respect to the diffusion kinetics of carbon in TiC 1 À x , [26] there were not many reported research regarding the Ti layer as embedded between SiC and W-25Re alloy. While compared to the original interface, thicknesses of both reaction layer and sigma phase were significantly decreased due to the limitation of diffusion of Si atom.…”
Section: Introductionmentioning
confidence: 99%
“…Annealing experiment was conducted with the designed functionally graded materials which embedding the Ti layer between SiC and W-25Re alloy were annealed using the same experimental conditions. Although there were some previous researches with respect to the diffusion kinetics of carbon in TiC 1 À x , [26] there were not many reported research regarding the Ti layer as embedded between SiC and W-25Re alloy. While compared to the original interface, thicknesses of both reaction layer and sigma phase were significantly decreased due to the limitation of diffusion of Si atom.…”
Section: Introductionmentioning
confidence: 99%
“…Tungsten (W), which is considered as a metal of superlatives, exhibits excellent electrical, mechanical and physical properties, such as high melting point ( T m = 3422 °C), high erosion resistance, reduced long‐term activation, and radiation tolerance, which makes this material of particular interest for many scientific and technological applications . On the other hand, it has been widely demonstrated in the literature that the properties and phenomena of W and W‐based materials can be controlled by tailoring the composition and processing conditions . W exhibits cubic ( bcc ) phase ( α ‐W) and metastable A15 phase ( β ‐W) with quite different physical, chemical, electronic, and mechanical properties.…”
mentioning
confidence: 99%
“…Tungsten has been serving the electronics, photonics, electro‐optics, mechanics, and electro‐mechanical industries for several decades. In addition to very high melting point of all metals, W also exhibits excellent high temperature strength and high creep resistance, which allow the material to be used in extreme environment mechanical applications . In X‐ray technology, W films are used as absorption masks in X‐ray lithography or diffracting layers in X‐ray mirrors .…”
mentioning
confidence: 99%
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