2010
DOI: 10.1016/j.jpor.2010.03.005
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Thickness and surface structure of a ceramic layer created on three indirect resin composites with aerosol deposition

Abstract: Purpose: Aerosol deposition is a technology for coating ceramics with impact consolidation at room temperature. The aim of the present study was to investigate the thickness and the microstructure of the aluminium oxide layer on different three dental resin composite materials created by means of aerosol deposition.Methods: Disk-shaped specimens were fabricated with three resin composites (Estenia C&B, Targis, and Gradia). The specimens were ground flat, and then subjected to aerosol deposition using aluminium… Show more

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Cited by 8 publications
(2 citation statements)
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“…Indirect composite resin (ICR) materials are widely used in dentistry for the fabrication of aesthetic restorations, dentures, and orthodontic appliances in recent years 10 and considered one of the most popular and preferred dental material for patients as well as dentists 11 due to adequate flexibility and maneuverability, 10 lower cost and similar aesthetic property compared with ceramics. 12 The failure rate of composite-veneered restorations does not significantly differ from that of metal-ceramic restorations, but is lower than that of porcelain-veneered restorations.…”
Section: Introductionmentioning
confidence: 99%
“…Indirect composite resin (ICR) materials are widely used in dentistry for the fabrication of aesthetic restorations, dentures, and orthodontic appliances in recent years 10 and considered one of the most popular and preferred dental material for patients as well as dentists 11 due to adequate flexibility and maneuverability, 10 lower cost and similar aesthetic property compared with ceramics. 12 The failure rate of composite-veneered restorations does not significantly differ from that of metal-ceramic restorations, but is lower than that of porcelain-veneered restorations.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, the temperature used for Ti 3 SiC 2 film deposition using other methods than ADM is, at the minimum, equal to 650 • C, 66 but mostly above 800 • C. 23,26 Consequently, ADM is suitable to deposit onto many kinds of substrates including those with a low melting point like plastics. 58,67,68 Secondly, it is possible to start the deposition from a powder with the final desired composition, so that no gaseous mixture of precursors 19,20 is necessary and again no specific stoichiometry or substrates. 21 Finally, the energy deployed for ADM is only determined by the creation of a differential pressure, and does not need additional energy to activate or enhance a chemical reaction or to vaporize or ablate a target.…”
Section: Introductionmentioning
confidence: 99%