Dense yttrium oxide film was prepared on a quartz substrate by the aerosol deposition process at the room temperature. The deposition rate was very high, 60 m/h. Thick film of 10 m was easily achievable on the quartz substrate. Transmission electron microscopy showed that the film was highly dense without voids and was composed of randomly oriented Y2O3 crystallites of sizes smaller than 20 nm. The interface between the film layer and the quartz substrate was homogeneous. The film (2‐m thick) had a high transmittance (55–85%) in the wavelength region of 250‐800 nm. The mechanical properties of the film were very good. The adhesion force of the interface between the Y2O3 layer and the quartz substrate was over 80 MPa. The Vickers hardness of the film was 7.7 GPa. The film also had an excellent plasma resistance in a gas mixture of CF4/O2. Outstanding results were noted in eroded depth, surface roughness, nanostructure, and transmittance change after plasma exposure of the film.

Dense yttrium oxide film was prepared by aerosol deposition process at room temperature. The deposition rate was very high ࣽ60 mmh. The thickness of the films were 25 mm and 10 mm on aluminum alloy and quartz substrates, respectively. Transmission electron microscopy showed that the film was highly dense without voids and had a homogeneous interface between the layer and the quartz substrate used. The film was composed of randomly oriented Y 2 O 3 crystallites of size less than 20 nm. The film 2 mm thick had a 55-85ಚ transmittance in the region 250-800 nm. Electrical and mechanical properties of the film were examined. The volume resistivity of the film was 10 14 Qऄcm. The adhesion force of the interface between the Y 2 O 3 layer and the substrate was 59 MPa.

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