2010
DOI: 10.1149/1.3474149
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Thickness Dependence of Indium-Tin Oxide Thin Films Deposited by RF Magnetron Sputtering

Abstract: Indium-tin oxide is a ceramic material that exhibits electrical conductivity and optical transparency. It is used as transparent electrode in many optoelectronic devices. Among the possible deposition methods, magnetron sputtering is one of the most attractive techniques due to its good reproducibility and possibility of uniform deposition over large areas. In this work, indium-tin oxide thin films with different deposition times were obtained by radio frequency magnetron sputtering without intentional substra… Show more

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“…25 Capacitance-Voltage (C-V) measurement is also an indirect evaluation of the TCO workfunction, 26 but it is sometimes too sensitive to the defect density at the interface between the TCO and the silicon substrate. Furthermore, the TCO film growth is influenced by several parameters, like the substrate nature and morphology 27,28 or the layer thickness, 29 that can modify the film properties during the growth and, in turn, modify the film work function. Consequently, the mentioned techniques can only assess Φ TCO at the free surface.…”
Section: Samples Preparationmentioning
confidence: 99%
“…25 Capacitance-Voltage (C-V) measurement is also an indirect evaluation of the TCO workfunction, 26 but it is sometimes too sensitive to the defect density at the interface between the TCO and the silicon substrate. Furthermore, the TCO film growth is influenced by several parameters, like the substrate nature and morphology 27,28 or the layer thickness, 29 that can modify the film properties during the growth and, in turn, modify the film work function. Consequently, the mentioned techniques can only assess Φ TCO at the free surface.…”
Section: Samples Preparationmentioning
confidence: 99%