Thickness Dependent Characteristics of Chemically Deposited Tin Sulfide Films

Abstract

In this study, the chemical bath deposition technique was used to produce tin sulfide thin films. The SnS films have been prepared using stannous chloride as a tin ion source and sodium thiosulphate as a sulfur ion source. Ethylenediaminetetraacetic acid disodium salt-2-hydrate was used as complexing agent in the chemical bath deposition process. The crystallographic analysis and film thickness were characterized using X-ray diffraction and profilometer, respectively.There were many deposition parameters which influenced the deposition of SnS films. Each deposition parameter influenced all the others. Based on the experimental results, the thickest films were obtained from a solution of pH 12, deposition time of 3 hours,bath temperature of 50 °C, 0.15M of SnCl2 and 0.5 M of Na2S2O3 solution.