Thickness effect in the photocatalytic activity of TiO2 thin films derived from sol-gel process

Xianyu, Wenxu; Park, Myun Kyu; Lee, Wan In

doi:10.1007/bf02705616

Cited by 23 publications

(12 citation statements)

References 13 publications

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“…Blanco et al [18] reported the highest photocatalytic activity for a 250 nm-thick sol-gel-deposited TiO 2 film. On the contrary, Xianyu et al [19] reported, for sol-gel dip-coated TiO 2 films, an increase in photocatalytic activity within a thickness range of 70-670 nm. A similar increase in photocatalytic activity within the thickness range of 100 to 500 nm has also been reported for DC magnetron sputtered TiO 2 films [6].…”

Section: Introductionmentioning

confidence: 92%

“…In the case of photocatalytic self-cleaning surfaces, it is important to define in which thickness the catalyst layer shows the highest photocatalytic activity and transparency in the visible spectral range in order to provide the required self-cleaning activity while retaining the visual appearance of the 2 of 13 coated surface. The effect of thickness on photocatalytic activity has been studied for nanocrystalline TiO 2 thin films, for example, obtained by atomic layer deposition (ALD) [9,10], sputtering [6,11,12], metal-organic chemical vapor deposition (MOCVD) [13,14], and sol-gel methods [15][16][17][18][19].…”

Section: Introductionmentioning

confidence: 99%

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Thickness Effect on Photocatalytic Activity of TiO2 Thin Films Fabricated by Ultrasonic Spray Pyrolysis

et al. 2020

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In this study, TiO2 thin films were deposited by ultrasonic spray pyrolysis from solutions with concentrations of 0.1 and 0.2 M. The deposition temperature was adjusted at 350 °C and all samples were annealed at 500 °C for 1 h in air. The thickness of TiO2 films was changed in the range of 50 to ca. 800 nm by varying the number of spray cycles from 1 to 21 and the solution concentration. The results showed that the mean crystallite size of the anatase structure, the surface roughness, and light absorption increased with the film thickness. The effect of film thickness on the photocatalytic activity was investigated with the photodegradation of stearic acid under UV-A irradiation. The optimal thickness of TiO2 films fabricated by ultrasonic spray pyrolysis for photocatalytic self-cleaning applications was in the range of 170–230 nm, indicating a ca. 2.6 times-higher photocatalytic self-cleaning activity compared to the reference sample, Pilkington ActivTM. The photocatalytic results showed that the 190 nm-thick TiO2 film deposited from the 0.1 M solution applying seven spray cycles exhibited the finest grain structure and maximum photocatalytic activity, leading to 94% of stearic acid degradation in 180 min under UV-A light with the reaction rate constant k = 0.01648 min−1.

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Section: Introductionmentioning

confidence: 92%

Section: Introductionmentioning

confidence: 99%

Thickness Effect on Photocatalytic Activity of TiO2 Thin Films Fabricated by Ultrasonic Spray Pyrolysis

et al. 2020

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“…As reported in Fig. 4 on the Raman spectra and considering in a first approximation that the Raman intensity is proportional to the amount of anatase, it can be noted that this allotropic variety of interest for Photo Catalytic Activity (PCA), is raising with the thickness, thus providing more active sites for the photogeneration of electron − /hole + pairs required for PCA 30 .…”

Section: Resultsmentioning

confidence: 83%

“…As reported in Fig. 4 on the Raman spectra and considering in a first approximation that the Raman intensity is proportional to the amount of anatase, it can be noted that www.nature.com/scientificreports/ this allotropic variety of interest for Photo Catalytic Activity (PCA), is raising with the thickness, thus providing more active sites for the photogeneration of electron − /hole + pairs required for PCA 30 . As presented above, the plasma power injected into the ECWR plasma source and the thickness of the titanium dioxide film have a strong impact on the surface morphology layer, the degree of crystallinity of the TiO 2 and consequently, on the photocatalytic properties of the coated substrates.…”

Section: Resultsmentioning

confidence: 92%

Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source

Dey

Bulou

Gaulain

et al. 2020

Sci Rep

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Photocatalytic surfaces have the potentiality to respond to many of nowadays societal concerns such as clean H2 generation, CO2 conversion, organic pollutant removal or virus inactivation. Despite its numerous superior properties, the wide development of TiO2 photocatalytic surfaces suffers from important drawbacks. Hence, the high temperature usually required (> 450 °C) for the synthesis of anatase TiO2 is still a challenge to outreach. In this article, we report the development and optimisation of an ECWR-PECVD process enabling the deposition of anatase TiO2 thin films at low substrate temperature. Scanning of experimental parameters such as RF power and deposition time was achieved in order to maximise photocatalytic activity. The careful selection of the deposition parameters (RF power, deposition time and plasma gas composition) enabled the synthesis of coatings exhibiting photocatalytic activity comparable to industrial references such as P25 Degussa and Pilkington Activ at a substrate temperature below 200 °C. In addition, to further decrease the substrate temperature, the interest of pulsing the plasma RF source was investigated. Using a duty cycle of 50%, it is thus possible to synthesise photocatalytic anatase TiO2 thin films at a substrate temperature below 115 °C with a deposition rate around 10 nm/min.

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“…For the 1-, 2-, 3-, 4-and 5-time coatings, the film thickness of been reported to play a major role in controlling PE [21]. The optimal thickness of the TiO 2 film was affected by the photodegradation parameters such as the VOC component, photocatalysts' properties, flow rate, and relative humidity.…”

Section: Effect Of Tio 2 Film Thickness On the Photodegradation Of Gamentioning

confidence: 95%

Preparation of porous carbon-doped TiO2 film by sol–gel method and its application for the removal of gaseous toluene in the optical fiber reactor

Kim

Liu

Nam

et al. 2011

Journal of Industrial and Engineering Chemistry

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Thickness effect in the photocatalytic activity of TiO2 thin films derived from sol-gel process

Cited by 23 publications

References 13 publications

Thickness Effect on Photocatalytic Activity of TiO2 Thin Films Fabricated by Ultrasonic Spray Pyrolysis

Thickness Effect on Photocatalytic Activity of TiO2 Thin Films Fabricated by Ultrasonic Spray Pyrolysis

Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source

Preparation of porous carbon-doped TiO2 film by sol–gel method and its application for the removal of gaseous toluene in the optical fiber reactor

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