2009 IEEE International Interconnect Technology Conference 2009
DOI: 10.1109/iitc.2009.5090361
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Thin-layer Au-Sn solder bonding process for wafer-level packaging, electrical interconnections and MEMS applications

Abstract: The developed bonding process utilizes AuSn solder and provides liquid-proof sealing and multiple reliable electrical connections between the bonded wafers. The bond can withstand 300ºC and features a thin bond line (2-3 µm), high bond strength, excellent bond gap control, and low stress due to small amount of bonding material. A Nb/Au seed layer was shown to be an optimal adhesion and barrier film.

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Cited by 26 publications
(16 citation statements)
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“…Due to a number of inherent advantages, Au 0.8 Sn 0.2 eutectic bonding has been heavily researched for WLVP packaging and demonstrated using surrogate proxy wafers [31,32,33,34,35,36], RF MEMS switches [37,38], MEMS resonators [39], and infrared imaging smart sensors [40]. In this approach, Au 0.8 Sn 0.2 is deposited on either the lid or device wafer, and a wettable layer, typically Au, is deposited on the other wafer.…”
Section: Bonding Approachesmentioning
confidence: 99%
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“…Due to a number of inherent advantages, Au 0.8 Sn 0.2 eutectic bonding has been heavily researched for WLVP packaging and demonstrated using surrogate proxy wafers [31,32,33,34,35,36], RF MEMS switches [37,38], MEMS resonators [39], and infrared imaging smart sensors [40]. In this approach, Au 0.8 Sn 0.2 is deposited on either the lid or device wafer, and a wettable layer, typically Au, is deposited on the other wafer.…”
Section: Bonding Approachesmentioning
confidence: 99%
“…At 81% and 75% Au by weight, the melting temperature is equal to 340 °C and 333 °C, respectively [34]. To realize the melting temperature of 280 °C, the alloy composition must be precisely controlled, which creates process control challenges during deposition and bonding.…”
Section: Bonding Approachesmentioning
confidence: 99%
“…Metal-to-metal wafer bonding has recently been increasingly attractive in the field of wafer-level MEMS packaging because the technique could significantly decrease the sealing line area which would result in the chip size reduction, realize hermetic sealing, and also enable electrical interconnections between the two bonded wafers [1,2]. Lowtemperature wafer bonding has also become important for various purposes such as reducing the post-bond residual stress at mechanical structures in MEMS devices, and preventing bowing or cracks when bonding two materials with dissimilar coefficients of thermal expansion (CTE).…”
Section: Introductionmentioning
confidence: 99%
“…In MEMS devices as well as electronics devices, wafer level vacuum packaging is one of the most important issues to reduce fabrication cost and to realize easy encapsulation [1][2][3] . For the wafer level packaging, low temperature bonding has an important role to reduce residual stress mainly due to the mismatch of the coefficient of thermal expansion (CTE) between substrates [4][5][6] .…”
Section: Introductionmentioning
confidence: 99%