2012
DOI: 10.1039/c1lc20810a
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Three-dimensional closed microfluidic channel fabrication by stepper projection single step lithography: the diabolo effect

Abstract: Microfluidic devices are currently being used in many types of biochemical microsystems for liquid phase analysis in the frame of medical applications. This paper presents a new technique for the realization of microfluidic channels using SU-8, a commonly used epoxy-based negative photo-resist. These microchannels were fabricated by a single stepper UV-photolithography process. By changing the process parameters, e.g. the optical focus depth and the UV exposure dose, well-defined, covered microchannels with va… Show more

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Cited by 14 publications
(8 citation statements)
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“…Once the transistors and interconnections ended (figures 4), we realized covered fluidic channels, using the SU8-3D technique [12], which has been optimized for 5 µm wide channels (figure 5). Firstly, concerning MOSFET characterizations, we obtained very low subthreshold current: 10 -14 A for Vg = 2V and low leakage currents through the gate (figure 6).…”
Section: Nanoisfet Structurementioning
confidence: 99%
“…Once the transistors and interconnections ended (figures 4), we realized covered fluidic channels, using the SU8-3D technique [12], which has been optimized for 5 µm wide channels (figure 5). Firstly, concerning MOSFET characterizations, we obtained very low subthreshold current: 10 -14 A for Vg = 2V and low leakage currents through the gate (figure 6).…”
Section: Nanoisfet Structurementioning
confidence: 99%
“…Figure 1 shows a schematic of the SiO2/Si3N4/Ti/Au MISFET device. A 50 µm-thick SU-8 photoresist layer was patterned to fabricate 10 µm-wide and 35 µm-high 3D microfluidic channels as well as micro-tanks and neurons areas of reception using the "Stepper technology" [27].…”
Section: Design and Fabrication Of Biosensorsmentioning
confidence: 99%
“…Finally, wafer-level packaging process was performed using the SU-8 technology. In our case, SU-8, a commonly used epoxy-based negative photo-resist was used to define the gate area, to passivate the chip surface, to isolate the electrical connections from the liquid environment and to fabricate fluidic micro devices while using the "stepper technology" in a non-standard way [19].…”
Section: A Mosfet/chemfet Microdevices Fabricationmentioning
confidence: 99%