Three-dimensional nanodome-printed transparent conductors for high-performing Si photodetectors

Kim, Hong-Sik; Yun, Ju-Hyung; Park, Hyeong‐Ho; Kumar, M. Melvin David; Kim, Sangho

doi:10.1016/j.matlet.2015.02.090

Cited by 7 publications

(5 citation statements)

References 14 publications

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“…Nanoscaled NiO possesses excellent transmittance greater than 90% for visible and near infrared regions; however, the high absorption coefficient in the UV-A region makes this material excellent for optoelectrical devices with an additional transparent function. That nanoscale NiO offers the highest possible transparency to date 52 , is due to the spherical nanocrystalline NiO 40 53 54 . The absorption coefficient, α, is estimated using the following relation:…”

Section: Resultsmentioning

confidence: 99%

Active Adoption of Void Formation in Metal-Oxide for All Transparent Super-Performing Photodetectors

Patel

Kim

Park

et al. 2016

Sci Rep

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Could ‘defect-considered’ void formation in metal-oxide be actively used? Is it possible to realize stable void formation in a metal-oxide layer, beyond unexpected observations, for functional utilization? Herein we demonstrate the effective tailoring of void formation of NiO for ultra-sensitive UV photodetection. NiO was formed onto pre-sputtered ZnO for a large size and spontaneously formed abrupt p-NiO/n-ZnO heterojunction device. To form voids at an interface, rapid thermal process was performed, resulting in highly visible light transparency (85–95%). This heterojunction provides extremely low saturation current (<0.1 nA) with an extraordinary rectifying ratio value of over 3000 and works well without any additional metal electrodes. Under UV illumination, we can observe the fast photoresponse time (10 ms) along with the highest possible responsivity (1.8 A W−1) and excellent detectivity (2 × 1013 Jones) due to the existence of an intrinsic-void layer at the interface. We consider this as the first report on metal-oxide-based void formation (Kirkendall effect) for effective photoelectric device applications. We propose that the active adoption of ‘defect-considered’ Kirkendall-voids will open up a new era for metal-oxide based photoelectric devices.

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Section: Resultsmentioning

confidence: 99%

Active Adoption of Void Formation in Metal-Oxide for All Transparent Super-Performing Photodetectors

Patel

Kim

Park

et al. 2016

Sci Rep

Self Cite

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“…These optical properties could hold the proposed transparent metal film structure with applications for transparent conductors [6,15,16] and plasmonic filters [17,18].…”

Section: Introductionmentioning

confidence: 92%

A simple strategy for tuning the opaque metal film to BE optical transparency by the dielectric cavity

Liu

Huang

et al. 2015

Materials Letters

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“…LEDs convert the electric energy to light emission and solar cells generate electric power from the incident photon energy. This basic and important understanding may provide mutual applications of photoelectric devices [8,9].…”

mentioning

confidence: 95%

Three-dimensional nanodome-printed transparent conductors for high-performing Si photodetectors

Cited by 7 publications

References 14 publications

Active Adoption of Void Formation in Metal-Oxide for All Transparent Super-Performing Photodetectors

Active Adoption of Void Formation in Metal-Oxide for All Transparent Super-Performing Photodetectors

A simple strategy for tuning the opaque metal film to BE optical transparency by the dielectric cavity

Comment on “Improving Light Outcoupling Efficiency for OLEDs with Microlens Array Fabricated on Transparent Substrate”

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