2012
DOI: 10.1166/jnn.2012.6195
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Threshold Voltage Fluctuation in 16-nm-Gate FinFETs Induced by Random Work Function of Nanosized Metal Grain

Abstract: The random work-function (WK) induced threshold voltage fluctuation (sigmaVth) in 16 nm Titanium Nitride (TiN) metal-gate fin-type field effect transistors (FinFETs) is explored and modeled by using an experimentally validated Monte Carlo simulation approach. The influences of metal-grain size and device geometry aspect ratio on the random WK-induced sigmaVth are considered in the proposed equation analytically. The formula accounts for the inside of fluctuation and could be used for the assessment of effectiv… Show more

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Cited by 4 publications
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“…Notably, the aspect ratio was given from a fixed axis, so it would also be helpful to interpret the result versus the device dimension using the plot of a Pelgrom model. Although we have applied the Pelgrom model to explore the variability of fin-type field-effect transistors (FinFETs) [36], the same model, we assumed, can be applied to examine the variability of a GAA NW MOSFET device.…”
Section: Resultsmentioning
confidence: 99%
“…Notably, the aspect ratio was given from a fixed axis, so it would also be helpful to interpret the result versus the device dimension using the plot of a Pelgrom model. Although we have applied the Pelgrom model to explore the variability of fin-type field-effect transistors (FinFETs) [36], the same model, we assumed, can be applied to examine the variability of a GAA NW MOSFET device.…”
Section: Resultsmentioning
confidence: 99%