Ti doped Cr2O3 thin films: Atomic layer deposition, mechanical and optical properties

Salari Mehr, Mahtab; Aarik, Lauri; Jõgiaas, Taivo; Tarre, Aivar; Kasikov, Aarne; Roosalu, Kaspar; Mändar, Hugo

doi:10.1016/j.jallcom.2023.172041

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2024

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Cited by 4 publications

References 60 publications

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Atomic layer deposition, mechanical, wear resistance, and optical properties of (Cr1-xAlx)2O3 films on Si (100)

Mehr,

Aarik,

Jõgiaas

et al. 2024

Ceramics International

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Atomic layer deposition, mechanical, wear resistance, and optical properties of (Cr1-xAlx)2O3 films on Si (100)

Mehr,

Aarik,

Jõgiaas

et al. 2024

Ceramics International

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Eco-friendly and Recyclable Liquid Metal Synthesis of Two-Dimensional Cr₂O₃ and CrN Nanosheets for Photoresponse and Field Effect Transistors

Qiu,

Huang

2024

ACS Appl. Electron. Mater.

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In this study, a liquid metal gas injection method was employed to prepare two-dimensional (2D) chromium oxide (Cr2O3) and chromium nitride (CrN). The process, conducted at room temperature and atmospheric pressure, eliminates the need for high temperature and high pressure conditions typically required by conventional methods, thereby reducing energy consumption. The liquid metal used is nontoxic and can be recycled, making the entire experimental procedure environmentally friendly. The resulting amorphous chromium-based semiconductors were transformed to crystalline Cr2O3 and CrN through annealing and nitridation processes. The fabrication and characterization of photodetectors revealed the unique negative photoresponse behavior of Cr2O3 and CrN, with strong correlations to their metallic resistance characteristics confirmed through temperature-resistance measurements. The field-effect transistors demonstrated the p-type semiconductor properties of Cr2O3 and the n-type semiconductor properties of CrN with energy gaps of 3.3 and 0.6 eV, respectively. This research not only illustrates the application of the liquid metal gas injection method for the preparation of two-dimensional materials but also reveals the correlation between negative photoresponse and metallic resistance, providing valuable insights for the future development of photoresponse and contributing to the academic research on 2D materials and their synthesis methods.

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Annealing Effect on Structural and Mechanical Properties of Atomic Layer Deposited Cr₂O₃ Films Doped with Ti and Al

Mehr,

Aarik,

Jõgiaas

et al. 2024

2024 IEEE 14th International Conference Nanomaterials: Applications &Amp;amp; Properties (NAP)

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Ti doped Cr2O3 thin films: Atomic layer deposition, mechanical and optical properties

Cited by 4 publications

References 60 publications

Atomic layer deposition, mechanical, wear resistance, and optical properties of (Cr1-xAlx)2O3 films on Si (100)

Atomic layer deposition, mechanical, wear resistance, and optical properties of (Cr1-xAlx)2O3 films on Si (100)

Eco-friendly and Recyclable Liquid Metal Synthesis of Two-Dimensional Cr₂O₃ and CrN Nanosheets for Photoresponse and Field Effect Transistors

Annealing Effect on Structural and Mechanical Properties of Atomic Layer Deposited Cr₂O₃ Films Doped with Ti and Al

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Ti doped Cr2O3 thin films: Atomic layer deposition, mechanical and optical properties

Cited by 4 publications

References 60 publications

Atomic layer deposition, mechanical, wear resistance, and optical properties of (Cr1-xAlx)2O3 films on Si (100)

Atomic layer deposition, mechanical, wear resistance, and optical properties of (Cr1-xAlx)2O3 films on Si (100)

Eco-friendly and Recyclable Liquid Metal Synthesis of Two-Dimensional Cr2O3 and CrN Nanosheets for Photoresponse and Field Effect Transistors

Annealing Effect on Structural and Mechanical Properties of Atomic Layer Deposited Cr2O3 Films Doped with Ti and Al

Contact Info

Product

Resources

About

Eco-friendly and Recyclable Liquid Metal Synthesis of Two-Dimensional Cr₂O₃ and CrN Nanosheets for Photoresponse and Field Effect Transistors

Annealing Effect on Structural and Mechanical Properties of Atomic Layer Deposited Cr₂O₃ Films Doped with Ti and Al