We report on the growth, structural, electronic, and optical properties of Si-doped GaN∕AlxGa1−xN (x=0.11, 0.25) multiple-quantum-well structures grown on SiC by plasma-assisted molecular-beam epitaxy. We have demonstrated that the use of In as a surfactant during growth improves the structural and optical properties of these layers. Photoluminescence studies have made possible the identification of the fundamental and excited electronic levels by comparison with simulations of the electronic structure. Temperature dependence studies reveal an anomalous behavior of the photoluminescence intensity, which is the quenching of the e1−hh1 line, while the e2−hh1 and e3−hh1 transitions become dominant at room temperature in the samples with 11% and 25% Al in the barrier, respectively. This behavior can be explained by the population of the e2 and e3 electronic states by thermally excited carriers, and by the higher oscillator strength of e2−hh1 and e3−hh1 transitions compared with e1−hh1, due to the intense electric field in the quantum wells. Long inter-sub-band (ISB) relaxation times (40–100ps) have been measured in GaN∕AlGaN multiple quantum wells, as a consequence of the quenching of the longitudinal optical (LO)-phonon emission when the ISB transition energy is below the LO-phonon energy.