2021
DOI: 10.1088/1674-1056/abe3f5
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Time-resolved radial uniformity of pulse-modulated inductively coupled O2/Ar plasmas*

Abstract: Time-resolved radial uniformity of pulse-modulated inductively coupled O2/Ar plasma has been investigated by means of a Langmuir probe as well as an optical probe in this paper. The radial uniformity of plasma has been discussed through analyzing the nonuniformity factor β (calculated by the measured n e, lower β means higher plasma radial uniformity). The results show that during the active-glow period, the radial distribution of n e exhibits an almost flat profile at the b… Show more

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“…Tong 等人 [16] 采用混合模型研究了在带有射频偏压源的 Ar/O2/Cl2 ICP 中,射频偏压频率(2.26-27.12 MHz)对其放电特性的影响. 在脉 冲调制射频 Ar/O2 ICP 放电中,Xue 等人 [17][18] 采用相分辨发射光谱对射频源功率、 脉冲占空比和脉冲频率对等离子体状态参数的影响进行了实验研究;Liu 等人 [19] 讨论了等离子体径向均匀性在脉冲关闭前后的演化. Sun 等人 [20] 模拟了在脉冲调 制双频 Ar/O2 ICP 中,外线圈电流和占空比对等离子体均匀性的调制行为.…”
Section: 引 言unclassified
“…Tong 等人 [16] 采用混合模型研究了在带有射频偏压源的 Ar/O2/Cl2 ICP 中,射频偏压频率(2.26-27.12 MHz)对其放电特性的影响. 在脉 冲调制射频 Ar/O2 ICP 放电中,Xue 等人 [17][18] 采用相分辨发射光谱对射频源功率、 脉冲占空比和脉冲频率对等离子体状态参数的影响进行了实验研究;Liu 等人 [19] 讨论了等离子体径向均匀性在脉冲关闭前后的演化. Sun 等人 [20] 模拟了在脉冲调 制双频 Ar/O2 ICP 中,外线圈电流和占空比对等离子体均匀性的调制行为.…”
Section: 引 言unclassified