Time-resolved spatial distribution measurements of pulse-modulated argon plasmas in an inductively coupled plasma reactor

Park, Ji-Hwan; Kim, Dong Hwan; Kim, Yu-Sin; Chung, Chin-Wook

doi:10.1088/1361-6595/aa61c2

Cited by 12 publications

(6 citation statements)

References 36 publications

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“…The electron temperature [6] rapidly increases at the initial moment of the pulse, then decreases, and finally reaches equilibrium values. The maximum temperature values depend on the electron density that is realized in the discharge in the afterglow stage before the onset of the active phase of the pulse.…”

Section: Introductionmentioning

confidence: 99%

“…The effect weakened as the pressure decreased and as one approached the substrate. The authors of [6,7] explained the observed effects by the nonlocal kinetics of charged particles under the experimental conditions and by the patterns of diffusion.…”

Section: Introductionmentioning

confidence: 99%

“…It is not surprising that the wide practical use of RF discharges, in particular, in the problems of etching semiconductor wafers, has led to the appearance of numerous works [4][5][6][7][8][9][10][11][12][13][14][15][16][17] studying the pulse-modulated operation mode of plasma reactors.…”

Section: Introductionmentioning

confidence: 99%

“…In [6,7], the time dependencies of the electron temperature and ion flux in the volume of the plasma source were studied. It was shown that at the beginning of the pulse's active part, the ion flux reached its maximum near the walls of the plasma source, where the antenna was located.…”

Section: Introductionmentioning

confidence: 99%

“…References [4][5][6][7][8][9][10][11][12][13][14][15][16][17] primarily focus on ways to improve the operating modes of technological plasma reactors. Another type of plasma device widely used in terrestrial and space technologies is ion sources based on an inductive RF low-pressure discharge (p<1 mTorr).…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

Comparison of pulse-modulated and continuous operation modes of a radio-frequency inductive ion source

Zadiriev¹,

Kralkina²,

Вавилин³

et al. 2023

Plasma Sci. Technol.

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The paper describes an experimental study of the characteristics of a pulse-modulated radio-frequency (RF) discharge sustained at low pressures, typical of the operating modes of RF gridded ion sources. The motivation for the study is the question of whether the RF pulse-modulated mode can increase the efficiency of the ion source. The ion current values extracted from a RF inductive ion source operating in continuous and pulse-modulated modes were compared. The experimental data were also compared with the parameter calculations based on a 0-dimensional (0-D) numerical model of the discharge. The measurements showed that the pulse-modulated operation mode of the RF ion source had a noticeable advantage at the powers of the RF generator of 140 W and lower. However, as the generator power increased, the advantage was lost, because the pulse-modulated operation mode, having higher instant value of RF power, sooner than the continuous mode entered the region of existence, where the ion production cost begins to grow with RF power.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Comparison of pulse-modulated and continuous operation modes of a radio-frequency inductive ion source

Zadiriev¹,

Kralkina²,

Вавилин³

et al. 2023

Plasma Sci. Technol.

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Complex transients of input power and electron density in pulsed inductively coupled discharges

Gao

Zhang

et al. 2019

Journal of Applied Physics

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Time-dependent studies of pulsed inductively coupled Ar and Ar/CF4 discharges are presented in this work. By using a time-resolved power diagnosis system, i.e., a Langmuir probe and a Hairpin probe, the temporal evolutions of input power and electron density are measured. In the initial pulse stage, the input power exhibits two peaks, which are related to the properties of the source and the plasma, respectively. In addition, an overshoot of the electron density is observed in the initial pulse stage at high powers (500–800 W) and low pressures (1–10 mTorr), and the overshoot becomes weaker by increasing pressure (10–80 mTorr) or decreasing input power (200–500 W). This can be explained by the dependence of the power transfer efficiency on pressure and input power, as well as the balance between the electron production and loss rates. When the power is turned off, the electron density and the input power exhibit a peak at the initial afterglow period, due to the release of charges from capacitors and inductors in the radio frequency power source. In Ar/CF4 discharges, the plasma responds to the changes in the input power more quickly than in Ar discharges, so it takes a shorter time to reach the ionization equilibrium. This may be caused by more ionization channels, larger ionization cross section, and lower ionization thresholds in Ar/CF4 plasmas.

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Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating

Kwon¹,

Kwon

et al. 2020

Physics of Plasmas

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The volume-averaged global plasma model has been widely used to analyze the characteristics of plasma, although the spatial variation of plasma parameters cannot be obtained from it. It has also been used to obtain temporal plasma parameters for pulsed plasma sources. In this work, we analyzed the effect of an edge-to-center density ratio (h factor) and an electron heating model on the plasma parameters in pulsed plasma simulations using the global model for Ar discharges. In most previous pulse simulations using the global model, the h factor has been applied to pulse conditions in the same way it has been applied to radio frequency, and the power absorbed by the electrons was assumed to be equal to the applied power. However, in this work, we considered a time-varying h factor and determined the absorbed power using an analytical electron heating model, solving the spatially averaged transport equations in a self-consistent manner. We found that a decreased h factor increases the plasma density and consequently changes the time dependence of the electron temperature. In addition, the overshoot of the electron temperature is limited at the beginning of the pulse power-on in the self-consistent electron heating model. Our results are of great relevance with respect to the analysis of plasma parameters.

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Time-resolved spatial distribution measurements of pulse-modulated argon plasmas in an inductively coupled plasma reactor

Cited by 12 publications

References 36 publications

Comparison of pulse-modulated and continuous operation modes of a radio-frequency inductive ion source

Comparison of pulse-modulated and continuous operation modes of a radio-frequency inductive ion source

Complex transients of input power and electron density in pulsed inductively coupled discharges

Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating

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