Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects

Tomie, Toshihisa

doi:10.1117/1.jmm.11.2.021109

Cited by 34 publications

(22 citation statements)

References 31 publications

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“…The concept of spectral efficiency, η spec , was proposed by Tomie,4 which is defined as a ratio of the radiation energy in a specified spectral range to the whole radiation energy. Although the plasma generated by the glass laser gave the narrowest 6.8 nm peak, many other lines are emitted in a wide wavelength region, so the spectral efficiency into the region of 0.1 nm width at 6.8 nm is not high at all.…”

Section: Discussionmentioning

confidence: 99%

“…In the case of Mo/Si multilayer mirror, the bandwidth is about 2 %, and tin (Sn) with an atomic number of 50 is selected as the emitter of LPP. 4 At shorter wavelengths, La/B 4 C multilayer was reported to have a reflectivity of 58.7 % at 6.7 nm with the bandwidth as narrow as 0.6 %. 8 The peak wavelength of reflection can be changed slightly by changing spacing of multilayers but the bandwidth cannot be increased when a high reflectivity is required.…”

Section: -2mentioning

confidence: 99%

“…A laser-produced plasma (LPP) emits strong short wavelength radiation and finds many applications such as x-ray shadowgraphy of dense laser-imploded plasma, 1 x-ray laser, 2 x-ray microscopy of living cells, 3 extreme ultraviolet (EUV) lithography, 4 actinic inspection of phase defects in EUV mask blank, 5 photoelectron spectroscopy for observing electronic states of the topmost atomic layer of materials, 6,7 and so on. Requirements for an LPP are totally different in each application.…”

Section: Introductionmentioning

confidence: 99%

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Sharpening of the 6.8 nm peak in an Nd:YAG laser produced Gd plasma by using a pre-formed plasma

et al. 2016

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For effective use of a laser-produced-plasma (LPP) light source, an LPP is desired to emit a narrow spectral peak because the reflection spectrum of multilayer mirrors for guiding emission from the source is very narrow. While a Gd plasma has been studied extensively as an extreme ultraviolet (EUV) light source at around 6.8 nm, where La/B4C multilayer is reported to have a high reflectivity with a bandwidth of about 0.6 %, all previous works using an Nd:YAG laser reported very broad spectra. This paper reports the first narrowing of the 6.8 nm peak in the case of using an Nd:YAG laser to generate a Gd plasma by using a pre-pulse. The best peak narrowing is observed when a pre-formed plasma is heated by a 1064 nm main laser pulse with a duration of 10 ns at the irradiation density of 4x 1011 W/cm2 at a delay time of 50 ns after the pre-pulse irradiation. The observed spectral width of about 0.3 nm is about one fifth of the value for no pre-formed plasma. The peak wavelength of the 6.8 nm band shifted to a longer wavelength side and the peak was broadened both for lower and higher laser irradiation density. It is discussed that this robustness of the peak position of the 6.8 nm Gd peak against temperature change is suitable to achieve a narrow bandwidth from an LPP generated on solid. The observed spectra are compared with those previously reported in various conditions.

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Section: Discussionmentioning

confidence: 99%

Section: -2mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Sharpening of the 6.8 nm peak in an Nd:YAG laser produced Gd plasma by using a pre-formed plasma

et al. 2016

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“…[17] Today's information society is realized by the great progress of semiconductor technologies which was achieved by the increase of the integration by reducing the size of semiconductor circuits. This was enabled by the progress of lithography technology which prints in reduced size the circuit pattern.…”

Section: Fig 1 Eups Unit 2 That Is Available For Sample Analysis Anmentioning

confidence: 99%

Development of EUPS for analyzing electronic states of topmost atomic layer

Tomie

Ishitsuka²

2016

Synthesiology English edition

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“…The EUV power is required to be more than 100 W at the intermediate focus and the etendue is required to be less than 3 mm 2 str [1]. The two main competing technologies for the production of EUV radiation are the Discharge Produced Plasma (DPP) [2] and the Laser Produced Plasma (LPP) [3]. Most LPP sources use tin because it is a more efficient EUV radiator compared to Xenon.…”

Section: Introductionmentioning

confidence: 99%

Extreme Ultraviolet Source Based on Microwave Discharge Produced Plasma Using Cavity Resonator

Tashima¹,

Ohnishi²,

Hugrass³

et al. 2014

Proceedings of the 12th Asia Pacific Physics Conference (APPC12)

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A microwave discharged produced plasma (MDPP) source is used to generate 13.5 nm extreme ultra violet (EUV) radiation for applications in photolithography. The maximum power of the 2.45 GHz magnetron microwave source is 6 kW and it can be operated in a pulsed mode with repetition frequency up to 100 Hz. The working gas is Xenon at pressure in the range 0.5-1.2 Pa. Radiation in the visible and near UV range is removed with the help of a 100 nm Zr filter. The EUV radiation is reflected using two Mo/Si multilayer mirrors in order to attenuate the residual out of band radiation before measuring the in-band EUV using a silicon diode. The initial experiments were conducted at a reduced microwave power in order to avoid overheating the cavity in the absence of a fully operational cooling system. The experimental result shown that for microwave pulse from 1 ms to 10 ms, intensity was increased 6 times lager. For microwave power, time averaged intensity was increased rapidly 0 mV to 1.2 mV at microwave power of 50 W to 150 W. And it was observed that intensity was increased slowly 1.2 mV to 2 mV at 175 W to 475 W. It is anticipated that more EUV power is generated when the facility is operated at higher microwave input power after the installation of the cooling system.

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Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects

Cited by 34 publications

References 31 publications

Sharpening of the 6.8 nm peak in an Nd:YAG laser produced Gd plasma by using a pre-formed plasma

Sharpening of the 6.8 nm peak in an Nd:YAG laser produced Gd plasma by using a pre-formed plasma

Development of EUPS for analyzing electronic states of topmost atomic layer

Extreme Ultraviolet Source Based on Microwave Discharge Produced Plasma Using Cavity Resonator

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