2021
DOI: 10.1016/j.tsf.2021.138637
|View full text |Cite
|
Sign up to set email alerts
|

Titanium dioxide thin films as vacuum ultraviolet photoconductive detectors with enhanced photoconductivity by gamma-ray irradiation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
6
0

Year Published

2021
2021
2023
2023

Publication Types

Select...
8

Relationship

3
5

Authors

Journals

citations
Cited by 8 publications
(6 citation statements)
references
References 35 publications
0
6
0
Order By: Relevance
“…Furthermore, we also investigate the improvement of its photoconductivity in the VUV region using TiO 2 thin films deposited on high resistivity undoped silicon (Si), quartz glass (SiO 2 ), and soda lime glass (SLG) substrates with thicknesses of 80 nm, 500 nm, and 1000 nm. Our results show that TiO 2 thin films in general—but especially TiO 2 thin films deposited on SiO 2 substrate with a thickness of 80 nm exhibit higher photoconductivity, with photocurrents reaching the milli-Ampere range, compared with our previous works using wide band gap fluorine-based insulator thin film photoconductive detectors [ 26 , 27 ] and gamma-ray irradiated detectors, based on amorphous TiO 2 on SLG substrate [ 28 ]. The potential of using TiO 2 thin films as photoconductive detectors of VUV radiation will contribute to the enhancement of the many applications of this high energy radiation.…”
Section: Introductionmentioning
confidence: 50%
See 1 more Smart Citation
“…Furthermore, we also investigate the improvement of its photoconductivity in the VUV region using TiO 2 thin films deposited on high resistivity undoped silicon (Si), quartz glass (SiO 2 ), and soda lime glass (SLG) substrates with thicknesses of 80 nm, 500 nm, and 1000 nm. Our results show that TiO 2 thin films in general—but especially TiO 2 thin films deposited on SiO 2 substrate with a thickness of 80 nm exhibit higher photoconductivity, with photocurrents reaching the milli-Ampere range, compared with our previous works using wide band gap fluorine-based insulator thin film photoconductive detectors [ 26 , 27 ] and gamma-ray irradiated detectors, based on amorphous TiO 2 on SLG substrate [ 28 ]. The potential of using TiO 2 thin films as photoconductive detectors of VUV radiation will contribute to the enhancement of the many applications of this high energy radiation.…”
Section: Introductionmentioning
confidence: 50%
“…The photoconductivity of the thin film detectors was evaluated by illuminating their surface with a VUV lamp (Hamamatsu Photonics, Hamamatsu, Japan) emitting at a peak wavelength of 160 nm [ 28 ] and a radiant intensity of about 1.4 μW cm −2 mm −1 at a distance of 50 cm from the lamp. While applying a bias voltage of up to 100 V across the Al electrodes, the photocurrent produced by the photo-generated carriers as they drifted towards the Al electrodes was measured using an ultra-high-resistance electrometer (ADCMT 8340A, Hamamatsu, Japan).…”
Section: Methodsmentioning
confidence: 99%
“…Moreover, the luminescence intensity increased, while the transmittance decreased as the films became thicker. The luminescence emission can therefore be attributed to the radiative recombination of electrons in deep traps and holes in the valence band [ 30 , 33 , 34 , 35 , 36 , 37 , 38 ]. The increase in the luminescence intensity confirms that thicker films have more defect states.…”
Section: Resultsmentioning
confidence: 99%
“…In this paper, we explore the photoconductivity of titanium dioxide (TiO 2 ) thin films in the UV-C wavelength region, especially with 260 nm wavelength excitation. Mostly known for its UV photocatalytic activity, TiO 2 has excellent chemical, physical, and optical properties including being a wide band-gap semiconductor [ 29 , 30 ]. Compared with ZnO, GaN, AlN, and BN, TiO 2 is relatively easier and cheaper to fabricate.…”
Section: Introductionmentioning
confidence: 99%
“…Marilou et al used pure titanium as a target material for VUV radiation photodetectors [ 12 ]. They prepared TiO 2 films by reactive DC magnetron sputtering on the surface of soda lime glass (SLG) microscope slide substrates.…”
Section: Optoelectrical Application Based On Tio 2 ...mentioning
confidence: 99%