Tolerance analysis of 4×4 SU-8 polymer array waveguide grating

Lin, Huang-Cuang; Huang, Hsin-Chun; Tsao, Shyh‐Lin

doi:10.1016/j.optcom.2005.02.044

Cited by 11 publications

(3 citation statements)

References 29 publications

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“…Palik's model was used to define the dielectric function of Au [37]. The RI of the photoresist and SU-8 polymer used in the simulations were 1.54 [38] and 1.61 [39], respectively. where p is the lattice periodicity, i and j are the grating orders of the reciprocal lattice, and e d and e m are the wavelength dependent relative dielectric constant of medium and metal, respectively.…”

Section: Numerical Calculations By Finite Difference Time Domain (Fdt...mentioning

confidence: 99%

High sensitivity plasmonic biosensor based on nanoimprinted quasi 3D nanosquares for cell detection

Zhu

Yang

et al. 2016

Nanotechnology

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Quasi three-dimensional (3D) plasmonic nanostructures consisting of Au nanosquares on top of SU-8 nanopillars and Au nanoholes on the bottom were developed and fabricated using nanoimprint lithography with simultaneous thermal and UV exposure. These 3D plasmonic nanostructures were used to detect cell concentration of lung cancer A549 cells, retinal pigment epithelial (RPE) cells, and breast cancer MCF-7 cells. Nanoimprint technology has the advantage of producing high uniformity plasmonic nanostructures for such biosensors. Multiple resonance modes were observed in these quasi 3D plasmonic nanostructures. The hybrid coupling of localized surface plasmon resonances and Fabry-Perot cavity modes in the quasi 3D nanostructures resulted in high sensitivity of 496 nm/refractive index unit. The plasmonic resonance peak wavelength and sensitivity could be tuned by varying the Au thickness. Resonance peak shifts for different cells at the same concentration were distinct due to their different cell area and confluency. The cell concentration detection limit covered a large range of 5 × 10(2) to 1 × 10(7) cells ml(-1) with these new plasmonic nanostructures. They also provide a large resonance peak shift of 51 nm for as little as 0.08 cells mm(-2) of RPE cells for high sensitivity cell detection.

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Section: Numerical Calculations By Finite Difference Time Domain (Fdt...mentioning

confidence: 99%

High sensitivity plasmonic biosensor based on nanoimprinted quasi 3D nanosquares for cell detection

Zhu

Yang

et al. 2016

Nanotechnology

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Section: Introductionmentioning

confidence: 99%

“…It is obvious that the advantages of the resist compared with PMMA are a higher sensitivity and chemical stability [10]. Inducting the negative resist for optical waveguide material, it is very significant for optimizing producing process and enhancing optical performances of AWG device [11,12]. In this article, we discuss the optimized structural properties of the polymeric waveguides by the scanning electron microscope (SEM) images, show the design parameters of the mask, fabrication procedures, and optical performances of the polymeric 41 ϫ 41 AWG device, measure the propagation loss of optical waveguide at 1550-nm wavelength by the cut-back method, analyze the calculated transmission spectra, and obtain actual pass wavelengths spacing of the AWG multiplexer.…”

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confidence: 99%

Research and fabrication of a UV curable polymeric 41 × 41 array‐waveguide grating multiplexer

Chen

Zhang

et al. 2007

Micro & Optical Tech Letters

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In this experiment, we could transmit the SSIL signal over 10-km because of the chromatic dispersion effect from the large 3-dB bandwidth of the signal about 0.45 nm. To increase the transmission distance, the bandwidth of the signal should be reduced. Because the reduced bandwidth introduces the lower SNR, however, the alternate SOA for increasing the noise reduction efficiency should be used such as cascaded SOAs [6] or a long length SOA. CONCLUSIONWe successfully demonstrated that a GS-SOA with a holding light could be used as an optical power booster in optical access network using a SSIL source. With the holding light, the signal distortion in the GS-SOA due to the carrier depletion was suppressed and, as a result, the Q-factor was dramatically improved. For a 2.5-Gb/s SSIL signal transmitted over 10 km of SMF, the highest gain-Q-factor product of 96.3 was obtained by using the proposed booster for P in ϭ Ϫ3 dBm and P hl ϭ Ϫ12 dBm. The corresponding BER was lowered to 6 ϫ 10 Ϫ11 . ACKNOWLEDGMENTSThis work was partially supported by KOSEF through grant No. R01-2006-000-11088-0 from the Basic Program. 6. S.-J. Kim, J.-H. Han, J.-S. Lee, and C.-S. Park, Suppression of the intensity noise in a 10 Gbit/s spectrum-sliced incoherent light channel using gain-saturated semiconductor optical amplifiers, Electron The recent and rapid development in demand for optical Internet services and data communication has prompted many research groups to study dense wavelength division multiplexing systems. Specially, array-waveguide grating (AWG) fabricated by using polymeric optical waveguides are attracting considerable interest because of their potential applications in optical communications, optical interconnections, and integrated optics [1][2][3][4]. Key issues in the polymeric waveguide materials include a low propagation loss at 1550-nm wavelength, a high thermal stability and small birefringence, easy control of refractive index, large volume, and low cost production facilities. These features make polymeric AWG devices apt for employing planar light wave circuit technology [5,6]. In the past few years, the rising polymeric SU-8 2005(MicroChem, MA), a kind of thick negative resist with high aspect ratio, high sidewall quality, high transparency (above 400 nm), good self-leveling up capability, and dimensional control is playing a key role in microelectro mechanical systems(MEMS) and micro-optic-electromechanical systems [7][8][9]. It is obvious that the advantages of the resist compared with PMMA are a higher sensitivity and chemical stability [10]. Inducting the negative resist for optical waveguide material, it is very significant for optimizing producing process and enhancing optical performances of AWG device [11,12]. In this article, we discuss the optimized structural properties of the polymeric waveguides by the scanning electron microscope (SEM) images, show the design parameters of the mask, fabrication procedures, and optical performances of the polymeric 41 ϫ 41 AWG device, measure the propagation loss of o...

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Highly fluorinated low‐molecular‐weight photoresists for optical waveguides

Wan

Fei

Shi

et al. 2010

J. Polym. Sci. A Polym. Chem.

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A series of highly fluorinated polymers were synthesized by copolymerization of 2,3,4,5,6‐pentafluorostyrene (PFS) and fluorinated styrene derivate monomer (FSDM). Their chemical structure were confirmed by 1H NMR, 13C NMR, and 19F NMR spectra. The refractive index and cross‐linking density of the polymers can be tuned and controlled by monitoring the feed ratio of comonomers. A series of negative‐type low‐molecular‐weight fluorinated photoresists (NFPs) were prepared by composing of fluorinated polystyrene derivates (FPSDs), diphenyl iodonium salt as a photoacid generator (PAG) and solvent. The polymer films prepared from NFP by photocuring exhibited excellent chemical resistance and thermal stabilities (Td ranged from 230.5 to 258.1 °C). A clear negative pattern was obtained through direct UV exposure and chemical development. For waveguides without upper cladding, the propagation loss of the channel waveguides was measured to be 0.25 dB/cm at 1550 nm. © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011

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Tolerance analysis of 4×4 SU-8 polymer array waveguide grating

Cited by 11 publications

References 29 publications

High sensitivity plasmonic biosensor based on nanoimprinted quasi 3D nanosquares for cell detection

High sensitivity plasmonic biosensor based on nanoimprinted quasi 3D nanosquares for cell detection

Research and fabrication of a UV curable polymeric 41 × 41 array‐waveguide grating multiplexer

Highly fluorinated low‐molecular‐weight photoresists for optical waveguides

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