Toluene combustion over NiO nanoparticles on mesoporous SiO2 prepared by atomic layer deposition

Au/MnO /3DOM SiO2: Highly active catalysts for toluene oxidation

“…20,000 and 40,000 mL/(g h), respectively) over 0.93Au/11.2MnOx/3DOM SiO2 was much better than that (T90% = 300 o C at 35,000 h 1 ) over 1.5 wt% Au/7.5 wt% CeO2/Al2O3 [10] , that (T90% = 350 o C at 35,000 h 1 ) over 1.5 wt% Au/TiO2 [10], that (T90% = 401 o C at 35,000 h 1 ) over 1.5 wt% Au/Al2O3 [10], and that (T90% = 290 o C at 53,050 h 1 ) over 0.86 wt% Au/MnOx [45], but inferior to that (T90% = 240 o C at 20,000 mL/(g h)) over mesoporous MnO2 [46], that (T90% = 247 o C at 3,000 mL/(g h)) over NiO/ SiO2 [47], that (T90% = 170 o C at 20,000 mL/(g h)) over 6.4 wt% Au/3DOM…”

Temperature regulated-chemical vapor deposition for incorporating NiO nanoparticles into mesoporous media

“…6. Recently, the ALD method has been extensively used for deposition of nanoparticles and thin films on porous materials such as SiO 2 and Al 2 O 3 [1][2][3]6,24,25,28,42,43]. As shown in Fig.…”

“…Nanoparticles are generally highly active for many heterogeneous catalytic reactions for a variety of reasons, including high surface area and abundance of catalytically active undercoordinated and metal-substrate interface sites [1][2][3][4][5][6]. One of the key issues in the fabrication of heterogeneous catalysts is the stabilization of nanoparticles, since nanoparticles smaller than ∼5 nm are generally less stable than larger entities and often undergo significant agglomeration during reactions [7][8][9][10][11][12][13][14][15][16].…”

“…Although there are not many choices for post-incorporation of catalytically active nanoparticles into already formed mesoporous support materials, one possibility enabling this process is atomic layer deposition (ALD). Over the last few decades, research groups have shown that ALD can be used to incorporate transition metal and metal oxide nanoparticles into mesoporous media with a penetration depth of several micrometers, i.e., not only pores on the outermost surface can be decorated with catalytically active nanoparticles, but also in deeper parts of mesoporous supporting materials [1][2][3]6,[21][22][23][24][25][26][27][28][29][30][31][32][33]. In ALD, an inorganic precursor is inserted into the reactor with the substrate, and then un-adsorbed or physisorbed precursors are purged, followed by insertion of secondary reagents.…”

“…Many strategies have been developed for incorporating catalytically active nanoparticles into mesoporous substrates, which can increase the stability of nanoparticles compared to those supported by non-porous substrate structures [1,2,[4][5][6][17][18][19][20][21][22][23]. Although there are not many choices for post-incorporation of catalytically active nanoparticles into already formed mesoporous support materials, one possibility enabling this process is atomic layer deposition (ALD).…”