Nanostructured Materials in Electrochemistry 2008
DOI: 10.1002/9783527621507.ch3
|View full text |Cite
|
Sign up to set email alerts
|

Top‐Down Approaches to the Fabrication of Nanopatterned Electrodes

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
1
0

Year Published

2014
2014
2024
2024

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 55 publications
(102 reference statements)
0
1
0
Order By: Relevance
“…For low-cost and high-throughput fabrication of nanoelectrode arrays, nano-imprint lithography (NIL) can be applied 22 . For NIL a mechanical deformation of resist by a stamp (with a high resolution pattern) occur.…”
mentioning
confidence: 99%
“…For low-cost and high-throughput fabrication of nanoelectrode arrays, nano-imprint lithography (NIL) can be applied 22 . For NIL a mechanical deformation of resist by a stamp (with a high resolution pattern) occur.…”
mentioning
confidence: 99%