2009
DOI: 10.1021/nn901220g
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Top-Down Fabrication of Sub-30 nm Monocrystalline Silicon Nanowires Using Conventional Microfabrication

Abstract: We report a new low-cost top-down silicon nanowire fabrication technology requiring only conventional microfabrication processes including microlithography, oxidation, and wet anisotropic plane-dependent etching; high quality silicon nanowire arrays can be easily made in any conventional microfabrication facility without nanolithography or expensive equipment. Silicon nanowires with scalable lateral dimensions ranging from 200 nm down to 10-20 nm and lengths up to approximately 100 microm can be precisely form… Show more

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Cited by 88 publications
(106 citation statements)
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“…ver the past decade, silicon nanowires have been widely researched for application as biochemical sensors [1]- [12]. Silicon nanowires are of interest for a number of reasons, for example a high surface-to-volume ratio gives high sensitivity and electrical sensing gives real-time, label-free detection without the use of expensive optical components.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…ver the past decade, silicon nanowires have been widely researched for application as biochemical sensors [1]- [12]. Silicon nanowires are of interest for a number of reasons, for example a high surface-to-volume ratio gives high sensitivity and electrical sensing gives real-time, label-free detection without the use of expensive optical components.…”
Section: Introductionmentioning
confidence: 99%
“…Low-cost manufacture is critically important for nanowire biosensor applications because for widespread uptake of biosensors in Point of Care settings, the biosensor needs to be disposable and hence very cheap. Several groups [10]- [12] have researched top-down approaches that do not need advanced lithography by using coarser lithography and specialist wet etches to reduce the nanowire diameter. However, these approaches still use expensive SOI wafers and have the disadvantage that wet etches are generally not favored for manufacturing.…”
Section: Introductionmentioning
confidence: 99%
“…All steps have been demonstrated with proof-of-principle experiments, and this shows the capability and versatility of our PaSCAl platform. The electrical lysis and extraction of the cell content using an EOF are currently optimized, and this will be combined with actual analysis of biomolecules from the cell using, e.g., integrated nanostructures in the side channels such as silicon nanowires [38] that provide the required sensitivity for single molecule detection and analysis.…”
Section: Discussionmentioning
confidence: 99%
“…Boron activation inside Si was carried out directly after the implantations step through an annealing process. SiNWs were then defined by plane-dependent wet etching (PDE) [8]. The most important steps for PDE definition of SiNWs are depicted in Fig.…”
Section: Experimental Apparatusmentioning
confidence: 99%