CONVENTIONAL bottom emitting organic light-emitting devices (OLEDs) commonly use conductive indium tin oxide (ITO) as anode because of its high conductivity, transparency, and work function. However, the surface of ITO glass is chemically and physically ill defined, which will degrade the performance as the hole-injecting electrode in OLEDs. Over the past years, many methods were used to treat the surface of ITO [1]- [5], such as ultraviolet-ozone cleaning and oxygen plasma exposure, in order to enhance hole injection [1], [2]. These treatments were effective in removing residual surface contaminants and increasing oxygen content at ITO surface, resulting in the increase of work function to minimize interfacial charge injection barriers.Moreover, the incorporation of injection enhancing interlayer at electrode-organic interfaces has been used as one alternative route to control carrier injection [6] In this brief, we use V 2 O 5 coating on transparent thin Au film as a composite hole-injection layer on ITO anode for bottom emitting OLEDs. The characteristics of bottom emitting OLEDs with the composite anodes of ITO-Au-V 2 O 5 are described. A thin oxide layer V 2 O 5 is used to modify the surface of Au for enhancing the hole injection from Au by the increase of work function to 5.3 eV and thus sequentially improves emission efficiency. The effects of V 2 O 5 layer on the enhancement of electrical properties of the bottom emitting OLEDs are discussed. Ultraviolet and X-ray photoelectron spectroscopy (UPS and XPS, respectively) analysis indicate that the higher work function of ITO/Au/V 2 O 5 (5.3 eV) than ITO/Au (5.0 eV) anode is due to Au surface band bending. Thus, the barrier for hole injection from ITO through Au/V 2 O 5 to the hole transport layer (HTL) is decreased. Our results show that the performance of OLEDs with V 2 O 5 layer is greatly improved compared with the case of only Au layer on the ITO. Interestingly, it is also better than the ITO anode modified by V 2 O 5 device.All devices were fabricated on ITO coated glass with a sheet resistance of 10 Ω/ , and thermally deposited LiF/Al was used as cathode. ITO substrate was cleaned and treated by O 2 plasma. The deposition was carried out at a pressure of less than 3 × 10 −4 Pa without any vacuum break. The organics and metal oxide were evaporated at the rate in a range of 0.3-0.4 nm/s. The Au metals were evaporated at the rate of ∼0.1 nm/s prior to the oxide and organic layer deposition. Al metal was evaporated at the rate of 0.3∼0.5 nm/s. The devices have an emissive area of 3.57 mm