2017
DOI: 10.1587/elex.14.20170411
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Total ionizing dose radiation effect on the threshold voltage for the uniaxial strained Si nano NMOSFET

Abstract: Abstract:The carrier microscopic transport process of uniaxial strained Si n-channel metal-oxide-semiconductor field-effect transistor (NMOSFET) has been analyzed under γ-ray radiation. The variation of oxide-trapped charge (N ot ) and interface-trap charge (N it ) with the total dose has also been investigated. A two-dimensional analytical model of threshold voltage (V th ) has been developed with the degradation due to the total dose irradiation taken into consideration. Based on this model, numerical simula… Show more

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Cited by 3 publications
(3 citation statements)
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“…The threshold voltage model of the uniaxial strained Si nanometer NMOSFET devices after considering the quantum effect and total dose radiation effect is calculated by [7]: where L, l and W d are channel length, characteristics scaling length and the maximum width of the depletion-layer, respectively. V FB,ssi , V DIBL , th,si , th,ssi , N a , V ds and " si are flat band voltage, drain-induced barrier lowering, threshold surface potential of relaxation and strained silicon, doping concentration in the channel, drain voltage and dielectric constant of silicon, respectively.…”
Section: Channel Current Modelmentioning
confidence: 99%
“…The threshold voltage model of the uniaxial strained Si nanometer NMOSFET devices after considering the quantum effect and total dose radiation effect is calculated by [7]: where L, l and W d are channel length, characteristics scaling length and the maximum width of the depletion-layer, respectively. V FB,ssi , V DIBL , th,si , th,ssi , N a , V ds and " si are flat band voltage, drain-induced barrier lowering, threshold surface potential of relaxation and strained silicon, doping concentration in the channel, drain voltage and dielectric constant of silicon, respectively.…”
Section: Channel Current Modelmentioning
confidence: 99%
“…[15]- [17]. Designing and modelling on the basis of silicon of the radiation-resistant pressure sensors, which are used in the aerospace, rocket and space industries, thermonuclear and nuclear energy [18]- [20], and of the strained heterostructures, which can be applied in the fields of high radiation [21]- [23], require the detailed research of the impact of radiation irradiation and deformation on the electrical properties of silicon. In most of the works, only the effect of radiation or deformation on the physical properties of silicon single crystals has been considered.…”
Section: Introductionmentioning
confidence: 99%
“…The application of Buck in space has to consider all kinds of radiation effect. For CMOS devices, total ionizing dose (TID) effect is prone to occur in the radiation environment, and it will lead to threshold voltage shift [1,2], transconductance degradation [3,4], carrier mobility reduction and leakage current [5,6,7,8], resulting in the degradation or failure of devices and circuits [9,10,11,12,13,14,15]. In this aspect, it is of great significance to research on the radiation-resistant reinforcement of Buck.…”
Section: Introductionmentioning
confidence: 99%