Total reflection amorphous carbon mirrors for vacuum ultraviolet free electron lasers

Steeg, B.; Juha, L.; Feldhaus, J.; Jacobi, S.; Sobierajski, R.; Michaelsen, C.; Andrejczuk, A.; Krzywiński, J.

doi:10.1063/1.1645320

Cited by 41 publications

(29 citation statements)

References 14 publications

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“…This is in a good agreement with the results of initial experiments conducted at the TTF1 FEL tuned to 98 nm, i.e., 0.07 J / cm 2 for a-C-40. 12 This is of the same order as the fluence F c at which the absorbed energy per atom is equal to the cohesive energy E c ,…”

Section: Resultsmentioning

confidence: 99%

Conductors, semiconductors, and insulators irradiated with short-wavelength free-electron laser

Krzywiński

Sobierajski

Jurek

et al. 2007

Journal of Applied Physics

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The results of a study of irreversible changes induced at surfaces of metals, semiconductors, and insulators by extreme ultraviolet ͑ Ͻ100 nm͒ ultrashort pulses provided by TESLA Test Facility Free-Electron Laser, Phase 1 ͑TTF1 FEL͒ are reported and discussed. The laser was tuned at 86, 89, and 98 nm during the experiments reported here. Energy spectra of ions ejected from the irradiated surfaces are also reported. Special attention is paid to the difference in the ablation behavior of ͑semi͒conductors and insulators that we have observed. The difference is dramatic, while the absorption coefficients are similar for all materials at the TTF1 FEL wavelength.

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Section: Resultsmentioning

confidence: 99%

Conductors, semiconductors, and insulators irradiated with short-wavelength free-electron laser

Krzywiński

Sobierajski

Jurek

et al. 2007

Journal of Applied Physics

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“…The stability of carbon films, along with their relatively high reflectance at grazing incidence, make C films a good choice for FEL mirrors. Several EUV FELs presently in operation involve mirrors based on sputter-deposited amorphous carbon films [60]. In this application, mirrors operate at grazing incidence to reduce radiation density on the coating, which results in a high reflectance in a wide spectral range of up to a photon energy of ~200 eV.…”

Section: B Optical Constants Of Ta-c Filmsmentioning

confidence: 99%

High reflectance ta-C coatings in the extreme ultraviolet

et al. 2013

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The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was significantly larger than the reflectance of a C film grown with average ion energy of ~20 eV and of C films deposited by sputtering or evaporation. The difference is attributed to a large proportion of sp 3 atom bonding in the ta-C film. This high reflectance is obtained for films deposited onto room-temperature substrates. The reflectance of ta-C films is higher than the standard singlelayer coating materials in the EUV spectral range below 130 nm. A selfconsistent set of optical constants of ta-C films was obtained with the Kramers-Krönig analysis using ellipsometry measurements in the 190-950 nm range and the EUV reflectance measurements. These optical constants allowed calculating the EUV reflectance of ta-C films at grazing incidence for applications such as free electron laser mirrors. 5962-5963 (1994). 9. G. F. Jacobus, R. P. Madden, and L. R. Canfield, "Reflecting films of platinum for the vacuum ultraviolet," J.Opt. Soc. Am. 53(9), 1084-1088 (1963). 10. W. R. Hunter, D. W. Angel, and G. Hass, "Optical properties of evaporated platinum films in the vacuum ultraviolet from 220 Å to 150 Å," J. Opt. Soc. Am. 69(12), 1695-1699 (1979). 11. G. Hass, G. F. Jacobus, and W. R. Hunter, "Optical properties of evaporated iridium in the vacuum ultraviolet from 500 Å to 2000 Å," J. Opt. Soc. Am. 57(6), 758-762 (1967). 12. J. T. Cox, G. Hass, J. B. Ramsey, and W. R. Hunter, "Reflectance and optical constants of evaporated osmium in the vacuum ultraviolet from 300 to 2000 Å," J. Opt. Soc. Am. 63(4), 435-438 (1973 Robertson, "Density, sp 3 fraction, and cross-sectional structure of amorphous carbon films determined by x-ray reflectivity and electron energy-loss spectroscopy," Phys. Rev. B 62(16), 11089-11103 (2000). 32. F. Xiong, Y. Y. Wang, and R. P. H. Chang, "Complex dielectric function of amorphous diamond films deposited by pulsed-excimer-laser ablation of graphite," Phys. Rev. B Condens. Matter 48(11), 8016-8023 (1993). 33. S. Waidmann, M. Knupfer, J. Fink, B. Kleinsorge, and J. Robertson, "Electronic structure studies of undoped and nitrogen-doped tetrahedral amorphous carbon using high-resolution electron energy-loss spectroscopy," J.

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“…Various materials were irradiated [9][10][11][12] with ellipsoidalmirror-focused XUV radiation (λ = 86 nm, τ = 30-100 fs) generated by the free-electron laser (FEL) operated at the TESLA Test Facility (i.e. the TTF1 FEL [13,14]) in Hamburg, Germany.…”

Section: Methodsmentioning

confidence: 99%

XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

Juha

Bittner

Chvostová

et al. 2005

Journal of Electron Spectroscopy and Related Phenomena

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For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, etch (ablation) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various very short-wavelength (λ < 100 nm) lasers, emitting pulses with durations ranging from ∼10 fs to ∼1 ns, have recently been placed into routine operation. This has facilitated the investigation of how ablation characteristics depend on the pulse duration in the XUV spectral region. Ablation of poly(methyl methacrylate) (PMMA) induced by three particular short-wavelength lasers emitting pulses of various durations, is reported in this contribution.

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Total reflection amorphous carbon mirrors for vacuum ultraviolet free electron lasers

Cited by 41 publications

References 14 publications

Conductors, semiconductors, and insulators irradiated with short-wavelength free-electron laser

Conductors, semiconductors, and insulators irradiated with short-wavelength free-electron laser

High reflectance ta-C coatings in the extreme ultraviolet

XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

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