We present a successful bottom-up approach to design
a generic
plasma-enhanced atomic layer deposition (PEALD) supercycle recipe
to grow high-quality indium gallium zinc oxide (IGZO) thin films with
tunable composition at a relatively low temperature of 150 °C. In situ real-time ellipsometric characterization in combination
with ex situ complementary techniques has been used
to optimize the deposition process and quality of the films by identifying
and solving growth challenges such as degree of oxidation, nucleation
delays, or elemental composition. The developed supercycle approach
enables facile control of the target composition by adapting the subcycle
ratios within the supercycle process. Compared to other low-temperature
deposition techniques resulting in amorphous films, our PEALD–IGZO
process at 150 °C results in nearly amorphous, nanocrystalline
films. The preparation of IGZO films at low temperature by a supercycle
PEALD approach allows controlling the thickness, composition, and
electrical properties while preventing thermally induced segregation.