Towards a Particle Based Simulation of Complex Plasma Driven Nanocomposite Formation

Bönitz, M.; Rosenthal, L.; Fujioka, Kenji; Zaporojtchenko, V.; Faupel, Franz; Kersten, Holger

doi:10.1002/ctpp.201200038

Cited by 21 publications

(20 citation statements)

References 33 publications

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“…[19][20][21][22] Especially for the particle-based simulation of nanocomposite formation, KMC simulations turned out to be a valuable tool since they allow for simplified but accurate selfconsistent descriptions of highly complex systems of macroscopic size. [21][22][23][24] In order to handle the complicated dynamics of nanocomposites, some drastic, but at the same time carefully chosen approximations are employed. The main idea behind the simulations is to condense all relevant physical effects into the behavior of simple geometric bodies.…”

Section: Simulation Modelmentioning

confidence: 99%

Simulation of nanocolumn formation in a plasma environment

Abraham

Kongsuwan

Strunskus

et al. 2015

Journal of Applied Physics

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Recent experiments and kinetic Monte Carlo (KMC) simulations [H. Greve et al., Appl. Phys. Lett. 88, 123103 (2006), L. Rosenthal et al., J. Appl. Phys. 114, 044305 (2013] demonstrated that physical vapor co-deposition of a metal alloy (Fe-Ni-Co) and a polymer (Teflon AF) is a suitable method to grow magnetic nanocolumns in a self-organized one-step process. While only thermal sources have been used so far, in this work, we analyze the feasibility of this process for the case of a sputtering source. For that purpose, we extend our previous simulation model by including a process that takes into account the influence of ions impinging on the substrate. The simulation results predict that metal nanocolumn formation should be possible. Furthermore, we show that the effect of ions that create trapping sites for the metal particles is to increase the number of nanocolumns.

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Section: Simulation Modelmentioning

confidence: 99%

Simulation of nanocolumn formation in a plasma environment

Abraham

Kongsuwan

Strunskus

et al. 2015

Journal of Applied Physics

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“…Instead the diffusive motion of the metal atoms on the surface is driven by fluctuating and dissipative forces. This is much simpler than atomistic or coarsegrained surface models, but it has been shown in previous kinetic Monte Carlo (KMC) studies [16,17,29,36,37] that the diffusive motion of the metal atoms can be appropriately described by employing a continuum model for the polymer. This treatment is physically motivated by the facts that the assembly of polymer chains is very disordered and the interaction between metal and polymer is typically very weak [38].…”

Section: Introductionmentioning

confidence: 99%

Molecular dynamics simulation of gold cluster growth during sputter deposition

Abraham

Strunskus

Faupel

et al. 2016

Journal of Applied Physics

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We present a molecular dynamics simulation scheme that we apply to study the time evolution of the self-organized growth process of metal cluster assemblies formed by sputter-deposited gold atoms on a planar surface. The simulation model incorporates the characteristics of the plasma-assisted deposition process and allows for an investigation over a wide range of deposition parameters. It is used to obtain data for the cluster properties which can directly be compared to recently published experimental data for gold on polystyrene (M. Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015)). While good agreement is found between the two, the simulations additionally provide valuable time-dependent real-space data of the surface morphology some of whose details are hidden in the reciprocal-space scattering images that were used for the experimental analysis.

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“…How electrons are trapped in or at the wall, what their binding energy and residence time is, how and from what kind of electronic states they are released, and how the sheath potential merges with the surface potential of the wall are beyond the scope of this crude modeling of the plasma wall. In dusty plasmas [4][5][6][7][8], for instance, the total amount of charge soaked up by the dust particles affects of course the overall characteristic of the discharge [9] and should thus be known as precisely as possible. In dusty plasmas [4][5][6][7][8], for instance, the total amount of charge soaked up by the dust particles affects of course the overall characteristic of the discharge [9] and should thus be known as precisely as possible.…”

Section: Introductionmentioning

confidence: 99%

Wall Charge and Potential from a Microscopic Point of View

Bronold

Fehske

Heinisch

et al. 2012

Contrib. Plasma Phys.

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Macroscopic objects floating in an ionized gas (plasma walls) accumulate electrons more efficiently than ions because the influx of electrons outruns the influx of ions. The floating potential acquired by plasma walls is thus negative with respect to the plasma potential. Until now plasma walls are typically treated as perfect absorbers for electrons and ions, irrespective of the microphysics at the surface responsible for charge deposition and extraction. This crude description, sufficient for present day technological plasmas, will run into problems in solid-state based gas discharges where, with continuing miniaturization, the wall becomes an integral part of the plasma device and the charge transfer across it has to be modelled more precisely. The purpose of this paper is to review our work, where we questioned the perfect absorber model and initiated a microscopic description of the charge transfer across plasma walls, put it into perspective, and indicate directions for future research.

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Towards a Particle Based Simulation of Complex Plasma Driven Nanocomposite Formation

Cited by 21 publications

References 33 publications

Simulation of nanocolumn formation in a plasma environment

Simulation of nanocolumn formation in a plasma environment

Molecular dynamics simulation of gold cluster growth during sputter deposition

Wall Charge and Potential from a Microscopic Point of View

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