2012
DOI: 10.1002/ctpp.201200032
|View full text |Cite
|
Sign up to set email alerts
|

Wall Charge and Potential from a Microscopic Point of View

Abstract: Macroscopic objects floating in an ionized gas (plasma walls) accumulate electrons more efficiently than ions because the influx of electrons outruns the influx of ions. The floating potential acquired by plasma walls is thus negative with respect to the plasma potential. Until now plasma walls are typically treated as perfect absorbers for electrons and ions, irrespective of the microphysics at the surface responsible for charge deposition and extraction. This crude description, sufficient for present day tec… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
32
0

Year Published

2012
2012
2012
2012

Publication Types

Select...
6

Relationship

2
4

Authors

Journals

citations
Cited by 28 publications
(33 citation statements)
references
References 39 publications
1
32
0
Order By: Relevance
“…The modeling activities -under progress -consider the dominant processes in the discharge volume as well as the interactions of relevant plasma species with dielectric surfaces [20][21][22][23]. The modeling activities -under progress -consider the dominant processes in the discharge volume as well as the interactions of relevant plasma species with dielectric surfaces [20][21][22][23].…”
Section: Introductionmentioning
confidence: 99%
“…The modeling activities -under progress -consider the dominant processes in the discharge volume as well as the interactions of relevant plasma species with dielectric surfaces [20][21][22][23]. The modeling activities -under progress -consider the dominant processes in the discharge volume as well as the interactions of relevant plasma species with dielectric surfaces [20][21][22][23].…”
Section: Introductionmentioning
confidence: 99%
“…Despite remarkable progress in recent years (for an overview, see [9]), many of the basic processes and, even more their complex interplay in a plasma, are still poorly understood. [6,7] and powerful theoretical and computational tools have been developed in plasma physics and many-particle theory, e.g., [11,12], the coupling of plasma [9] and surface processes [13,14] is yet far too complex to allow for a treatment based on microscopic approaches. However, until now no selfconsistent modeling of the plasma phase, the cluster growth in the plasma, the atom and cluster deposition and the processes on the surface and in the bulk of the substrate have been possible.…”
Section: Introductionmentioning
confidence: 99%
“…www.cpp-journal.org Further joint investigations by experiments in project B12 and modelling in project B3 are necessary to analyse in more detail the interaction of plasma and flow dynamics, the plasma chemistry of the thin-film precursors, the formation of surface charges (related to projects B10 [23] and B11 [24]) and the role of local field strengths on the structure of the deposited films. Within the field of plasma chemistry, it is intended to determine the substantial reactive molecular compounds present in the discharge by infrared absorption spectroscopy measurements together with project B2 [25].…”
Section: Resultsmentioning
confidence: 99%