2022
DOI: 10.1016/j.solmat.2022.111915
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Towards accurate atom scale characterisation of hydrogen passivation of interfaces in TOPCon architectures

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Cited by 6 publications
(1 citation statement)
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“…Hydrogen passivation of amorphous and crystalline silicon bulk, films, and surfaces [49][50][51][52][53][54][55][56][57][58] is technologically highly relevant for the fabrication of integrated, sensing, [51] and solar cell devices. [54][55][56] Examples for IR spectroscopic investigations of hydrogen-passivated samples are identification and analysis of the formation of Si-H x groups, [50,53,57] the study of the ideality of the formed passivated interface, [57] the verification of the removal or formation of an interfacial oxide layer, [58] and the analysis of a subsequent functionalization. [52] PMMA is a popular resist in microfabrication processes involving electron beam, photo-, and soft lithography.…”
Section: Introductionmentioning
confidence: 99%
“…Hydrogen passivation of amorphous and crystalline silicon bulk, films, and surfaces [49][50][51][52][53][54][55][56][57][58] is technologically highly relevant for the fabrication of integrated, sensing, [51] and solar cell devices. [54][55][56] Examples for IR spectroscopic investigations of hydrogen-passivated samples are identification and analysis of the formation of Si-H x groups, [50,53,57] the study of the ideality of the formed passivated interface, [57] the verification of the removal or formation of an interfacial oxide layer, [58] and the analysis of a subsequent functionalization. [52] PMMA is a popular resist in microfabrication processes involving electron beam, photo-, and soft lithography.…”
Section: Introductionmentioning
confidence: 99%