Abstract:-The determination of suitable process parameters for POCl 3 diffusion, with the aim of minimizing emitter recombination and obtaining satisfactory contactability of the homogeneous emitter, is the aim of this study. It can be shown that different emitters with low R sheet < 60 Ω/sq can result in significantly different emitter saturation current densities. Regarding the screen-printing metallization procedure, we observe that the resistance of a semiconductor-metal contact can vary on different emitters despi… Show more
“…A substantial "dead layer", like that found in emitter IND, can lead to formation of crystal defects and precipitates ( 4), thus degrading J 0e . Indeed, precipitates associated with "dead layer" leads to higher Shockley-Read-Hall recombination in the emitter, decreased emitter minority carrier lifetime, and degraded surface passivation potential via applied dielectric layers (5).…”
Section: Resultsmentioning
confidence: 99%
“…Comparing predicted V OC between fig. 3A and 3B, the large difference arises from heavy doping effects and increased Shockley-Read-Hall recombination in the high [P surface ] profile (5).…”
We have tailored phosphorus (P) emitter profiles via POCl3 diffusion to create solar cell emitters displaying low saturation current density (J0e
) in order to study the conditions necessary for high cell performance. Theoretical emitter modeling shows that surface P concentration ([Psurface]) plays a critical role in determining final open circuit voltage (VOC
). Cell data shows that contact resistance can vary widely as [Psurface] changes. Based on modeling and cell fabrication data, a POCl3 emitter has been optimized to deliver efficiency of 19.5% for full Al back surface field (BSF) cell structure and 20.4% for passivated emitter and rear cell (PERC) structure.
“…A substantial "dead layer", like that found in emitter IND, can lead to formation of crystal defects and precipitates ( 4), thus degrading J 0e . Indeed, precipitates associated with "dead layer" leads to higher Shockley-Read-Hall recombination in the emitter, decreased emitter minority carrier lifetime, and degraded surface passivation potential via applied dielectric layers (5).…”
Section: Resultsmentioning
confidence: 99%
“…Comparing predicted V OC between fig. 3A and 3B, the large difference arises from heavy doping effects and increased Shockley-Read-Hall recombination in the high [P surface ] profile (5).…”
We have tailored phosphorus (P) emitter profiles via POCl3 diffusion to create solar cell emitters displaying low saturation current density (J0e
) in order to study the conditions necessary for high cell performance. Theoretical emitter modeling shows that surface P concentration ([Psurface]) plays a critical role in determining final open circuit voltage (VOC
). Cell data shows that contact resistance can vary widely as [Psurface] changes. Based on modeling and cell fabrication data, a POCl3 emitter has been optimized to deliver efficiency of 19.5% for full Al back surface field (BSF) cell structure and 20.4% for passivated emitter and rear cell (PERC) structure.
“…8. 81,92,93 This masked etch-back process has been used in commercial production with industrial inkjet printers able to mask wafers at a rate of 500–4000 wafers/h. 61 Figure 8 Processing sequence for the selective-emitter formation using inkjet-printed masking lines…”
Patterning is fundamental to advancing most technologies. Although the challenge for electronic integrated circuits continues to be reduced feature size other applications have different requirements and challenges. This review contributes insights from silicon photovoltaics where patterning is required for selective doping etching and metallisation. Earlier silicon solar cell devices extensively used optical lithography to fabricate devices in the laboratory with high device efficiencies being achieved. However industrial cell fabrication has largely relied on uniformly doped silicon layers and lower resolution screen-printing for metal electrode formation because optical lithography is considered too expensive and slow. This has resulted in the average energy conversion efficiencies of industrially produced cells remaining on average 5% lower than the value of 25% reported in 1999 for cells patterned with optical lithography. Motivated by the goal of bridging this efficiency gap many new polymer patterning methods which do not require the formation of a qualified mask have been developed for different silicon solar cell designs. These polymer patterning methods fall into two general classes; (i) where the polymer mask is directly printed on the cell surface; and (ii) where a pattern is formed in a polymer layer using printers or lasers to effect the patterning. Many of the methods which are reviewed in this paper although developed with specific photovoltaic requirements in mind may also find applications in other fields of research and technology.
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