As
an emerging ultrathin semiconductor material, Bi2O2Se exhibits prominent performances in electronics, optoelectronics,
ultrafast optics, etc. However, until now, the in-plane
growth of Bi2O2Se thin films is mostly fulfilled
on atomically flat mica substrates with interfacial electrostatic
forces setting obstacles for Bi2O2Se transfer
to fabricate functional van der Waals heterostructures. In this work,
controlled growth of inclined Bi2O2Se ultrathin
films is realized with apparently reduced interfacial contact areas
upon mica flakes. Consequently, the transfer of Bi2O2Se could be facile by overcoming weaker electrostatic interactions.
From cross-sectional characterizations at the Bi2O2Se/mica interfaces, it is found that there are no oxide buffer
layers in existence for both in-plane and inclined growths, while
the un-neutralized charge density is apparently decreased for inclined
films. By mechanical pressing, inclined Bi2O2Se could be transferred onto SiO2/Si substrates, and back-gated
Bi2O2Se field effect transistors are fabricated,
outperforming previously reported in-plane Bi2O2Se devices transferred with the assistance of corrosive acids and
adhesive polymers. Furthermore, Bi2O2Se/graphene
heterostructures are fulfilled by a probe tip to fabricate hybrid
phototransistors with pristine interfaces, exhibiting highly efficient
photoresponses. The results in this work demonstrate the potential
of inclined Bi2O2Se to act as a building block
for prospective van der Waals heterostructures.