Transferable Integrated Optical SU8 Devices: From Micronic Waveguides to 1D-Nanostructures

Abstract

Abstract:We report on optical components for integrated optics applications at the micro-and nanoscale. Versatile shapes and dimensions are achievable due to the liquid phase processability of SU8 resist. On the one hand, by adjusting the UV-lithography process, waveguiding structures are patterned and released from their original substrate. They can be replaced on any other substrate and also immerged in liquid wherein they still show off efficient light confinement. On the other hand, filled and hollow 1D-nanostructures are achievable by the wetting template method. By exploiting the large range of available SU8 viscosities, nanowires of diameter ranging between 50 nm and 240 nm, as well as nanotubes of controllable wall thickness are presented. Optical injection, propagation, and coupling in such nanostructures are relevant for highly integrated devices.

Efficient active waveguiding properties of Mo6nano-cluster-doped polymer nanotubes

“…SU8 is a well-known photosensitive resist for lithography and it presents appropriate optical properties for waveguiding applications such as a high refractive index value of 1.58 at 650 nm, and a transparency above 90% in the visible and infrared ranges. Moreover, the large choice of available viscosities enables the control of inner and outer diameter while exploiting the wetting template method for nanofiber fabrication [22]. As an example, for a low viscosity (7.7 cSt), nanotubes with an internal diameter of 120 nm are observed, while for a large viscosity (4500 cSt), nanowires are formed (i.e.…”

Special Issue: 15 Years of SU8 as MEMS Material

“…Al-Halhouli et al use SU-8 to fabricate a synchronous micromotor, and investigate its use in various microfluidic applications [12]. Huby et al fabricated nanowires and nanotubes that can be used as optical waveguides [13]. Finally, Mekaru investigated the use of SU-8 in the fabrication of X-ray masks when combined with tapered silicon structures, and shows that the obtained masks can be used in grayscale X-ray lithography [14].…”