Transient heat transfer in batch thermal reactors for silicon wafer processing

A simulation code for batch heat treatments

“…This type of batch thermal reactor consists of three key elements: a stack of wafers, some electrical resistive heaters and a fused silica process tube. The simulation model developed in [5] has two significant thermal features: the radial temperature distribution on wafers follows a universal parabolic profile and the wafer stack gives rise to a strong cavity effect, which produces thermal radiation. The aim of that work was to characterise the dependence of wafer temperature nonuniformity on processing conditions, including the ramp rate and wafer spacing.…”