Transient voltage analysis on a series capacitor of the floating probe for plasma diagnostics

Lee, Moo-Young; Kim, Kyung-Hyun; Chung, Chin-Wook

doi:10.1088/1361-6595/aacf32

Cited by 5 publications

(4 citation statements)

References 13 publications

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“…Among these methods is the floating probe method, in which an ac voltage is applied to the probe via a blocking capacitor. This method has been studied by Braithwite et al [12] and Lee et al [13], among others [14], [15], [16]. Another method, known as the pulsed probe method [17], [18], uses a pulse signal for probe measurements.…”

Section: Introductionmentioning

confidence: 99%

Measuring Electron Temperature Using Pulsed and Floating Probe Method in Low-Pressure Gas Discharge Plasmas

Katahira

Ohuchi

Sato

2022

IEEE Trans. Plasma Sci.

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Plasma diagnostics of the electron temperature was performed through a hollow-cathode-type discharge tube using a pulsed and floating probe method. This method detects a shift in the floating potential when a pulse signal is fed into the probe through an intermediary blocking capacitor. The electron temperature was calculated in a previous study using the Bessel function of the nth order; however, the proposed method greatly simplifies the calculation. In the duty ratio between 10% and 30%, the electron temperature measured using the pulsed and floating probe methods was approximately equal to the tail electron temperature, and it was varied by adjusting the duty ratio.

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Section: Introductionmentioning

confidence: 99%

Measuring Electron Temperature Using Pulsed and Floating Probe Method in Low-Pressure Gas Discharge Plasmas

Katahira

Ohuchi

Sato

2022

IEEE Trans. Plasma Sci.

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“…Hwang et al measured the electron temperature using the floating potential difference by applying AC voltage to the probe tip and the ion density using the first harmonic current [7]. In recent work, we suggested the method of applying the square voltages to the probe tip and analysed the transient voltage of the capacitor connected in series to the probe for obtaining the electron temperature and ion density [8,9].…”

Section: Introductionmentioning

confidence: 99%

Improvement of the floating probe method for ion density and electron temperature measurement without compensation due to voltage reduction across the sheath

Lee¹,

Seo²,

Eo³

et al. 2021

Plasma Sources Sci. Technol.

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The floating probe method (FPM) applicable for processing plasma diagnostics was developed for the measurement of ion density and electron temperature (J. Appl. Phys. 101 033305). When an AC voltage is applied to a floating probe, harmonic currents are generated due to the nonlinearity of the sheath. The electron temperature and ion density are obtained using the harmonic currents and the voltage across the sheath. However, in the FPM, when the sensing resistance becomes similar to the sheath resistance, iterative calculations must be performed to compensate for the voltage reduction across the sheath due to the sensing resistor. In this paper, the voltage across a DC blocking capacitor is measured to directly obtain the voltage across the sheath. Therefore, it is not necessary to compensate for the voltage reduction across the sheath through iterative calculations. The electron temperature was increasingly overestimated as the capacity of the DC blocking capacitor became smaller. This overestimation was caused by the capacitive load effect and was compensated for using a correction for the second harmonic current. The measured electron temperature and ion density were compared with those from electron energy distribution functions (EEDFs) in an inductively coupled plasma, and they were in good agreement.

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“…However, this method cannot be used in processes where the exposed probe tip is coated with the dielectric lm. To overcome this limitation, electrical diagnostic methods have been suggested that use AC voltages applied to the probe [13][14][15][16][17]. Lee et al proposed the oating harmonic method (FHM), in which a sinusoidal voltage with a frequency in the range of kHz is applied to a probe [13].…”

Section: Introductionmentioning

confidence: 99%

“…Hwang et al used the self-bias effect by applying sinusoidal voltages to a probe because the change in oating potential is related to electron temperature [14]. Our previous study proposed an electrical diagnostic method applying square voltages because the transient voltage of a series capacitor connected to the oating probe is a function of plasma density and electron temperature [17].…”

Section: Introductionmentioning

confidence: 99%

A method for measuring plasma parameters and dielectric film thickness by analyzing transient voltages for deposition plasma processing monitoring

Lee

Jung

Kim

et al. 2020

Plasma Sources Sci. Technol.

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An electrical method is proposed to measure the dielectric lm thickness, electron temperature, and plasma density for deposition plasmas. In this method, a square voltage is applied to a at probe coated with a dielectric lm, and the transient voltage of a series capacitor connected to the probe is measured. The thickness of the dielectric lm is obtained from the transient voltage because the applied voltage is divided across the dielectric lm and the series capacitor. The deposited dielectric lm causes a change in transient voltage of the series capacitor. A circuit model with a nonlinear sheath, a series capacitor, and the dielectric lms is suggested to obtain plasma density and electron temperature. The time response of transient voltage is related to plasma density, electron temperature and total capacitance of the series capacitor and the dielectric lm. Two square voltages with different amplitudes were applied to measure plasma density and electron temperature. Experiments were conducted in inductively coupled plasma. Various capacitors were used to replace the dielectric lms, and a at probe coated with Al 2 O 3 was used to verify the measurement of dielectric lm thickness, showing the high accuracy of our method. In addition, the electron temperature from our method is in good agreement with that from electron energy distribution functions, and the plasma density is in good agreement with that from orbital motion limited theory. Therefore, this method would be useful for monitoring plasma parameters and deposited lm thickness in industrial plasma processing.

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Transient voltage analysis on a series capacitor of the floating probe for plasma diagnostics

Cited by 5 publications

References 13 publications

Measuring Electron Temperature Using Pulsed and Floating Probe Method in Low-Pressure Gas Discharge Plasmas

Measuring Electron Temperature Using Pulsed and Floating Probe Method in Low-Pressure Gas Discharge Plasmas

Improvement of the floating probe method for ion density and electron temperature measurement without compensation due to voltage reduction across the sheath

A method for measuring plasma parameters and dielectric film thickness by analyzing transient voltages for deposition plasma processing monitoring

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