Photolysis of the 3-methoxytrisilanyl complex
CpM(CO)2SiMe2SiMe2SiMe2OMe
(1a, M =
Ru; 1b, M = Fe) afforded the intramolecularly
methoxy-stabilized disilanyl−silylene complex
Cp(OC)M{SiMe2←O(Me)SiMe2SiMe2}
(2a, M = Ru; 2b, M = Fe) as a primary
product.
Prolonged irradiation of the solution resulted in the decay of
2a,b with release of a
dimethylsilylene moiety to give the methoxy-bridged bis(silylene)
complex Cp(OC)M{SiMe2···O(Me)···SiMe2}
(3a, M = Ru; 3b, M = Fe). The X-ray
crystal structure analysis of
2a revealed that 2a has a five-membered chelate
ring and the Ru−Si(silylene) bond (2.291(2) Å) is much shorter than the other Ru−Si bond (2.350(1) Å).
It can be concluded from
the bond lengths that the former possesses a partial double-bond
character while the latter
is a normal Ru−Si single bond. Photolysis of diisopropyl
derivatives
CpM(CO)2SiMe2Si
i
Pr2SiMe2OMe (4a, M = Ru; 4b, M =
Fe) gave
Cp(OC)M{SiMe2←O(Me)SiMe2Si
i
Pr2}
(5a, M =
Ru; 5b, M = Fe) exclusively, in which the positions of
substituents on silicon atoms in 5a
and 5b were determined by
29Si−1H COLOC and NOESY NMR spectra.
A mechanism
involving 1,2-migration of the methoxydisilanyl group to the metal
center was suggested.
Irradiation of the tetrasilanyl complex
CpFe(CO)2SiMe2SiMe2SiMe2SiMe2OMe
(6) caused a
complicated reaction, giving at least five products having methoxy
groups coordinated to
silylene ligands.