Transparent and Scratch-Resistant C:ZrOx Coatings on Polymer and Glass by Plasma-Enhanced Chemical Vapor Deposition

Abstract

Transparent and scratch‐resistant zirconium oxide thin films were deposited in radio‐frequency plasma‐enhanced chemical vapor deposition process on glass and polycarbonate substrates using zirconium‐tetra‐tert‐butoxide, [Zr(OtBu)4], as the precursor. Investigations on film morphology (AFM), thickness (cross‐sectional SEM), phase structure (X‐ray diffraction), chemical composition (X‐ray photoelectron spectroscopy), and optical properties (UV/Vis, ellipsometry) revealed the interplay of process parameters (plasma power, gas composition, deposition time, and precursor flux) on the composition and properties of the coatings. High‐quality transparent coatings (>90%) with a tunable refractive index (n=1.7–2.1) and abrasion‐resistant properties were deposited on both polymer and glass substrates. Despite low deposition temperatures (<100°C), the coatings showed good adherence to the substrate and extraordinary barrier properties that were further improved by depositing intermediary SiOx‐layers. Phase analysis of the predominantly amorphous films showed the incipient crystallization of ZrO2.

Photoelectrochemical properties of hematite films grown by plasma enhanced chemical vapor deposition

“…In the context of materials fabrication methodologies, the plasma enhanced chemical vapor deposition (PE-CVD) is a versatile technique for large-area deposition of metal oxide films at high growth rates and it offers several advantages for preparing metal oxide thin films with controlled morphology and more importantly on temperature-sensitive substrates [24]. Optimized plasma power, ion bombardment, and reactive gases are controllable parameters for selected modulation of films properties.…”

Hard Coating for Polymer Substrates Through Lamination and Peeling of Porous Anodized Zirconia

“…Although various coating methods, such as chemical vapor deposition (CVD), 6 7 pulsed reactive magnetron sputtering, 8 and sol-gel processing, 9 can be used to produce ZrO 2 films, they generally required high process temperatures (generally more than 400 C) to achieve continuous films, which causes serious damage to most polymer substrates. On the other hand, laser CVD methods can be used to produce ZrO 2 films at a range of conditions, however high defect densities occur when Copyright: American Scientific Publishers operated at low temperatures, for instance using Zr-terbutoxide as precursor at 130 C. 10 In order to overcome these shortcomings, an alternative process that may be performed at low temperature, requiring neither high process temperatures nor organic solvents, is greatly desired for polymer surface modification.…”

Plasma enhanced chemical vapour deposition of ZrO2 and YSZ coatings

“…However, this work focused on producing fully cubic yttriastabilized zirconia (c-YSZ) at low temperatures through the use of plasma-enhanced chemical vapour deposition (PE-CVD). Despite its high cost, PE-CVD is a technique that uses metallorganic precursors under vacuum, allowing the deposition of ceramic coatings with controlled microstructure and composition at temperatures as low as 100 °C [14][15][16][17]. Although deposition temperature and applied power are the most studied variables in PE-CVD [14][15][16][17], other variables such as evaporation temperature of the ZrO 2 precursor [14,15,18], substrate position within the heating zone [19], and oxygen content in the plasma [17] also have an important impact on the gas maturation, which directly influence the microstructure and phase content of coatings since they impact the homogeneous and heterogeneous reactions.…”

“…Despite its high cost, PE-CVD is a technique that uses metallorganic precursors under vacuum, allowing the deposition of ceramic coatings with controlled microstructure and composition at temperatures as low as 100 °C [14][15][16][17]. Although deposition temperature and applied power are the most studied variables in PE-CVD [14][15][16][17], other variables such as evaporation temperature of the ZrO 2 precursor [14,15,18], substrate position within the heating zone [19], and oxygen content in the plasma [17] also have an important impact on the gas maturation, which directly influence the microstructure and phase content of coatings since they impact the homogeneous and heterogeneous reactions. Generally, the decomposition temperature of the precursor should not be reached during its evaporation, since the decomposition must take place prefenciarily in the plasma medium before its deposition on the substrate [20].…”