2006
DOI: 10.1002/cvde.200506436
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Transparent Barrier Coatings for Flexible Organic Light-Emitting Diode Applications

Abstract: Silicon oxide (SiO x ) and silicon nitride (SiN x ) thin films have been deposited onto flexible polycarbonate (PC) substrates using plasma-enhanced (PE)CVD for transparent barrier applications. Comparing the internal stress, optical transparency, surface roughness, and impermeability results, a multilayer composed of parylene/SiO x /SiN x ...parylene/SiO x /SiN x (PON...PON) is deposited on PC substrates and the optimum thicknesses of the SiN x , SiO x , and parylene layers is determined. Under optimum condit… Show more

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Cited by 43 publications
(21 citation statements)
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“…The devices degrade very quickly due to water vapour and oxygen. Therefore water vapour transmission rates (WVTR) and oxygen transmission rates (OTR) must be lower than respectively 10 −6 g·m −2 per day and 10 −3 cm 3 ·m −2 per day, indicating a very high barrier layer is necessary [ 6 ]. Some of the applied techniques to deposit the OLED layers are very expensive and not roll-to-roll compatible.…”
Section: Resultsmentioning
confidence: 99%
“…The devices degrade very quickly due to water vapour and oxygen. Therefore water vapour transmission rates (WVTR) and oxygen transmission rates (OTR) must be lower than respectively 10 −6 g·m −2 per day and 10 −3 cm 3 ·m −2 per day, indicating a very high barrier layer is necessary [ 6 ]. Some of the applied techniques to deposit the OLED layers are very expensive and not roll-to-roll compatible.…”
Section: Resultsmentioning
confidence: 99%
“…A single inorganic barrier layer generated by a vacuum processing provided an enhancement of two or three orders of magnitude over OTR for polymeric substrates [125]. Analogy to OLED packaging, barrier layers which are impermeable to oxygen and moisture, such as SiO x [125][126][127], SiN x [127], and A1 2 O 3 [128], have been utilized to form high gas-resistant substrates. To acquire a high coating quality of the barrier layer, the wetting compatibility between the polymer matrix and the barrier should be examined.…”
Section: Improving Stability Of Qds Against Oxygen Andmentioning
confidence: 99%
“…This equivalent deposition method compared to the PECVD used to form SiO x films makes it possible to deposit both the polymer and the oxide in the same vacuum chamber. SiO x thin films deposited on parylene C substrates using PECVD have proven valuable to date in order to further improve their barrier properties (Wuu et al, 2006;Potscavage et al, 2009;Hogg et al, 2014;Kim et al, 2014). PECVD from organosilane precursors may however lead to undesired organic contamination of the expected Si-O network and to a complex population of defects, and these two factors severely degrade the barrier performance (Roberts et al, 2002).…”
Section: Introductionmentioning
confidence: 99%