Handbook of Transparent Conductors 2010
DOI: 10.1007/978-1-4419-1638-9_6
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Transparent Conducting Oxides Based on Tin Oxide

Abstract: Tin oxide (SnO 2 ) is an important and widely used wide band-gap semiconductor and is part of a family of binary transparent conducting oxides (TCO), such as Snand ZnO-doped In 2 O 3 (ITO, ZIO) [1] and ZnO:Al [2], CdO. It is of great interest in corrosive environment applications due to its high stability. This includes applications such as batteries, low emission windows coatings, solar cells, etc. In this chapter we will introduce the structural, electrical and optical properties of undoped and doped tin oxi… Show more

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Cited by 18 publications
(13 citation statements)
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“…The results for the SnO 2 :F layer of the TEC™ 15 in the solar cell yield a sheet resistance of 11.5 ± 1.1 Ω/sq, as determined from the resistivity and thickness and indicated in Table , which includes the key best fit optical parameters. Also from the resistivity and scattering time, a carrier concentration of 5.43 × 10 20 cm −3 and a mobility of 50 cm 2 /V s are deduced, assuming an electron effective mass for SnO 2 :F of m e * = 0.25 m e . In addition to the SnO 2 :F Drude parameters, whose best fit values are provided in Table , the constant contribution to the real part of ε ( E ) is varied for both the SnO 2 :F and the HRT layers.…”
Section: Resultsmentioning
confidence: 99%
“…The results for the SnO 2 :F layer of the TEC™ 15 in the solar cell yield a sheet resistance of 11.5 ± 1.1 Ω/sq, as determined from the resistivity and thickness and indicated in Table , which includes the key best fit optical parameters. Also from the resistivity and scattering time, a carrier concentration of 5.43 × 10 20 cm −3 and a mobility of 50 cm 2 /V s are deduced, assuming an electron effective mass for SnO 2 :F of m e * = 0.25 m e . In addition to the SnO 2 :F Drude parameters, whose best fit values are provided in Table , the constant contribution to the real part of ε ( E ) is varied for both the SnO 2 :F and the HRT layers.…”
Section: Resultsmentioning
confidence: 99%
“…ZnO is also more reactive towards oxygen than In 2 O 3 and therefore requires a more strict control of the oxygen supply during deposition [97]. F doped SnO 2 (FTO) offers exceptional chemical stability, high hardness, and excellent thermal stability although the minimum resistivity of 5 × 10 −4 Ω cm is higher than the best values achieved for ZnO:Al and ITO (10 −4 Ω cm) [98].…”
Section: Transparent Back Contactsmentioning
confidence: 99%
“…This widening of optical band gap is generally attributed to the Burstein-Moss shift (Kykyneshi et al 2010), which results from the filling of electronic states near the bottom of the conduction band, due to the increase of carrier concentration in the ZnO film. In this process, the apparent band gap of a semiconductor is increased as the absorption edge is pushed to higher energies, because of all states close to the conduction band being populated.…”
Section: Resultsmentioning
confidence: 99%
“…The electron generation can be explained using Kroger-Vink notation according to Eq. (2) (Kykyneshi et al 2010).…”
Section: Resultsmentioning
confidence: 99%