2006
DOI: 10.1051/epjap:2006039
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Transparent conducting ZnO-CdO thin films deposited by e-beam evaporation technique

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Cited by 22 publications
(22 citation statements)
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“…Figure 4 displays the refractive index spectra for the Sb-ZnO films suggesting normal dispersion behavior. Furthermore, n decreases with raising the annealing temperature according to increasing the transparency of the films with increasing annealing temperature (Mohamed et al, 2006), which is affirmed by our results. The dielectric function ε is characterized as , the real part ε 1 = n 2k 2 , the imaginary part ε 2 = 2nk is of the dielectric constant representing the dispersion and absorption respectively.…”
Section: Resultssupporting
confidence: 87%
“…Figure 4 displays the refractive index spectra for the Sb-ZnO films suggesting normal dispersion behavior. Furthermore, n decreases with raising the annealing temperature according to increasing the transparency of the films with increasing annealing temperature (Mohamed et al, 2006), which is affirmed by our results. The dielectric function ε is characterized as , the real part ε 1 = n 2k 2 , the imaginary part ε 2 = 2nk is of the dielectric constant representing the dispersion and absorption respectively.…”
Section: Resultssupporting
confidence: 87%
“…The low transmittance of as-deposited films is due to the lack of oxygen resulting from deposition by electron beam evaporation. This result was noted in our previous works [10,[17][18][19] and agrees with that in ref. [23].…”
Section: Effect Of Cdo Buffer Layer Thicknesssupporting
confidence: 94%
“…In our previous studies on pure and doped-CdO films deposited by e-beam [17][18][19], it was noted that these films have a high optical transmittance (>80%) in the visible region and a polycrystalline structure. Moreover, Xiu et al [20] studied CdO as a buffer layer to improve the structural properties of ZnO films.…”
Section: Introductionmentioning
confidence: 99%
“…When the films are annealed under ambient air at temperature higher than 350 C, oxygen is chemisorbed on the film surface and in pores, acting as an acceptor by accepting an electron from occupied conduction band states. 24) Furthermore, the adsorbed oxygen removes tin interstitials and/or oxygen vacancies, thus reduces the density of donors like defects and carrier concentration, 25,26) leading to an increase in the electrical resistivity. Figure 12 shows the annealing temperature dependence of carrier mobility.…”
Section: Effect Of Annealing Temperature Onmentioning
confidence: 99%