“…The ITO substrate is known for its high electrical conductivity, low capacitive current, electrochemical activity over a wide potential range, and stable physical and electrochemical properties. [4] However, these properties depend on the fabrication method applied, such as e-beam evaporation (EBE), [5] the spray pyrolysis, [6] chemical vapor deposition (CVD), [7] sol-gel, [8] laser ablation, [9] and DC [10] and RF sputtering. [11,12] Also the fabrication conditions influence the ITO properties, e.g.…”