We have used high-resolution X-ray photoelectron spectroscopy (XPS) to investigate the molecular dependence on sulfur chemical states of organosulfur monolayers of alkanethiol, dialkyl disulfide, monosulfide, thiophene, and aromatic thiols on a Au(111) surface. When monosulfides or thiophenes adsorbed on the Au surface, the S(2p) peaks appeared between 161 and 164 eV, and peak fitting revealed that these organosulfurs exhibited almost the same peaks as those of alkanethiol and dialklyl disulfide monolayers. The monolayer made from monosulfide with shorter alkyl chains exhibited almost the same S(2p) XPS spectrum as the typical alkanethiol or dialkyl disulfide monolayers. Another S(2p3/2) peak appeared for aromatic derivatized thiol SAMs at around 161 eV, in addition to strong doublet S(2p) peak observed at 162.0 and 163.3 eV in the S(2p) spectra. The 161 eV peak was observed even in the S(2p) XPS spectra of alkanethiol or dialkyl disulfide monolayers, at the initial stage of monolayer growth or after low-temperature (∼ 100 °C) annealing of low molecular density alkanethiol SAMs. We consider that this 161 eV peak can be formed without molecular decomposition as well as due to the atomic sulfur produced by C-S cleavage.

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