2015
DOI: 10.1007/s11664-015-3670-3
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Transparent ZnO Films Deposited by Aqueous Solution Process Under Various pH Conditions

Abstract: ZnO films were deposited using a spin-spray method with the source solution containing zinc nitrate and an oxidizing solution containing trisodium citrate onto glass substrates under various pH conditions. A ZnO film with a columnar structure was obtained at pH higher than 7.0, while no ZnO film was formed at a mixed solution pH of 6.7. The transparent and conductive ZnO film obtained from a mixed solution with pH 10.7 exhibited the lowest resistivity of 9.9 9 10 À3 X cm with a high transmittance above 90%.

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Cited by 7 publications
(4 citation statements)
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“…Sample D shows the highest transmittance in the visible-light region before annealing, while sample H shows the same after annealing. The average transmittances in the visible region (400-700 nm [35]) are 79.1% for sample D and 78.7% for sample H. There is no significant difference in the transmittance before and after annealing.…”
Section: Optical Properties and Sustainability Of Tio 2 Filmsmentioning
confidence: 87%
“…Sample D shows the highest transmittance in the visible-light region before annealing, while sample H shows the same after annealing. The average transmittances in the visible region (400-700 nm [35]) are 79.1% for sample D and 78.7% for sample H. There is no significant difference in the transmittance before and after annealing.…”
Section: Optical Properties and Sustainability Of Tio 2 Filmsmentioning
confidence: 87%
“…Due to its importance and recent advances in real-time x-ray scattering, the deposition of ZnO layers by spray deposition will be reviewed in this separate section: firstly, ZnO is a barrier layer and possible replacement for the titania layers in OPV and OE and has thus gained great interest [385]. Hence, the spray deposition of ZnO is an area of active research [372,[386][387][388][389][390][391][392][393], and will therefore be shortly reviewed.…”
Section: Deposition Of Zno Layersmentioning
confidence: 99%
“…Various deposition methods have previously been proposed for the deposition of high-quality β-Ga 2 O 3 films including pulsed laser deposition, chemical vapor deposition, metal organic chemical vapor deposition, and radio-frequency sputtering [11][12][13][14]; however, they are energy-intensive and require expensive equipment [15]. On the other hand, the solution process for film fabrication has many advantages including low environmental load and cost [15][16][17]. However, the structural properties of β-Ga 2 O 3 are not stable, and the solution process requires an annealing process at temperatures higher than 900 • C; therefore, a solution process for fabricating β-Ga 2 O 3 films is required [18].…”
Section: Introductionmentioning
confidence: 99%