2022
DOI: 10.1016/j.microrel.2022.114800
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Trap-assisted degradation mechanisms in E-mode p-GaN power HEMT: A review

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Cited by 8 publications
(4 citation statements)
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“…Discussions: Recently, researchers have studied buffer, barrier, and surface trapping mechanisms that generate traps during device growth phases [10]. A highly resistive buffer layer is created by doping carbon, resulting in extended defects from carbon compensations [11]. Fig.…”
Section: Topology and Methodologymentioning
confidence: 99%
“…Discussions: Recently, researchers have studied buffer, barrier, and surface trapping mechanisms that generate traps during device growth phases [10]. A highly resistive buffer layer is created by doping carbon, resulting in extended defects from carbon compensations [11]. Fig.…”
Section: Topology and Methodologymentioning
confidence: 99%
“…In this section, we have provided insight into the dynamic R DS-ON behavior of multi-GaN-chip cascode devices under different switching conditions. Numerous studies have investigated buffer, barrier, and surface trapping caused by traps generated during the GaN HEMT growth process [39,40]. Careful designing of the buffer resistivity plays a key role in achieving high breakdown voltage and low on-state resistance in GaN HEMT devices.…”
Section: Mechanism Analysismentioning
confidence: 99%
“…However, various GaN devices suffer from dynamic on-state resistance (R DS-ON ) degradation during system-level operations, which hinders their practical use [5,6]. One of the reasons is electron trapping or detrapping from buffer traps and/or surface traps, and hot electron generation in the channel due to hard switching conditions [7]. Despite numerous advanced technologies that mitigate the current collapse, dynamic R DS-ON degradation remains a major concern for commercial GaN devices.…”
mentioning
confidence: 99%
“…Discussions: In this section, we have discussed the dynamic R DS-ON reduction of a multi-GaN-chip cascode power module under different switching conditions. A number of studies have investigated the trapping of barrier, surface, and buffer layers caused by traps formed during GaN HEMT growth [7]. Achieving high breakdown voltage and low on-state resistance in GaN HEMT devices depends on carefully designing buffer resistivity [9].…”
mentioning
confidence: 99%