1990
DOI: 10.1103/physrevb.41.1054
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Trap-limited hydrogen diffusion in doped silicon

Abstract: Hydrogen depth profiles in highly doped p-type silicon are obtained from the analysis of infrared reflectance spectra of H-passivated samples. From these profiles, H-diffusion coefficients are calculated for different temperatures and dopant concentrations. The results are explained with the assumption that hydrogen diffusion is limited by trapping at the acceptor sites. A binding energy of 0.6 eV is found for B-H complexes, in agreement with previous ab initio calculations.

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Cited by 72 publications
(23 citation statements)
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“…15,17 For increasing hydrogenation time we would expect the movement of a front into the sample separating a fully passivated paramagnetic layer from an unpassivated ferromagnetic one. 42 Therefore, short-time hydrogenation should lead to similar changes in the SWR spectrum as a reduction in sample thickness via etching. Indeed, upon short-time hydrogenation the spin-wave resonances are also shifted to smaller magnetic fields ͓Fig.…”
Section: Partially Hydrogenated Samplementioning
confidence: 99%
See 1 more Smart Citation
“…15,17 For increasing hydrogenation time we would expect the movement of a front into the sample separating a fully passivated paramagnetic layer from an unpassivated ferromagnetic one. 42 Therefore, short-time hydrogenation should lead to similar changes in the SWR spectrum as a reduction in sample thickness via etching. Indeed, upon short-time hydrogenation the spin-wave resonances are also shifted to smaller magnetic fields ͓Fig.…”
Section: Partially Hydrogenated Samplementioning
confidence: 99%
“…In our model we divide the hydrogenation profile into a fully passivated region ͑0͒, a partially hydrogenated region ͑I͒ corresponding to the tail in the hydrogenation profile, and an unpassivated region ͑II and III͒. 42 In the fully passivated region ferromagnetism will be suppressed completely, while in the unpassivated region magnetic properties will remain unchanged. The partially hydrogenated tail will lead to a region with rapidly changing hole concentration and thus rapidly changing uniaxial anisotropy field H aniso 001 ͑z͒.…”
Section: ͑25͒mentioning
confidence: 99%
“…The time required for a complete passivation of GaMnAs can be attributed to the low extraction voltage from the plasma of Ϫ200 V used and the trap limited diffusion of hydrogen. 16 As a first step, the incorporation of deuterium into the GaMnAs layers was verified with secondary ion mass spectroscopy ͑SIMS͒. The depth profiles shown in Fig.…”
mentioning
confidence: 99%
“…The large scatter in data for diffusion of hydrogen through silicon 148,[196][197][198][199][200][201][202][203][204][205][206][207][208][209][210][211][212][213][214] . We have only plotted data for hydrogen diffusion (no isotopes) and have indicated the type of silicon where known.…”
Section: Noble Gasesmentioning
confidence: 99%