1992
DOI: 10.1063/1.107939
|View full text |Cite
|
Sign up to set email alerts
|

Tri-isopropyl gallium: A very promising precursor for chemical beam epitaxy

Abstract: The first reported use of tri-isopropyl gallium (TiPGa) in chemical beam epitaxy (CBE) is described. Hall measurements performed on the resulting undoped GaAs epitaxial layers indicate an order of magnitude reduction in unintentional carbon impurity levels compared to structures grown under comparable conditions using the standard CBE precursor, triethyl gallium. 2 K photoluminescence spectra match those recorded elsewhere from state-of-the-art high purity GaAs material grown by molecular beam epitaxy, and 77 … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
7
0

Year Published

1993
1993
2016
2016

Publication Types

Select...
6
2
1

Relationship

1
8

Authors

Journals

citations
Cited by 35 publications
(7 citation statements)
references
References 15 publications
0
7
0
Order By: Relevance
“…The growth temperature was calibrated by using the melting points of InSb and bismuth. Here, TIPGa was used for the QD and InGaAs-layer growth because its decomposition temperature is lower than that of TEGa [35]. Growth sequence for the QD samples was as follows.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…The growth temperature was calibrated by using the melting points of InSb and bismuth. Here, TIPGa was used for the QD and InGaAs-layer growth because its decomposition temperature is lower than that of TEGa [35]. Growth sequence for the QD samples was as follows.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Here, TIPGa was used for QD and QW growth because its decomposition temperature is lower than that of TEGa. 32) The samples studied here were 10-layer QDs with a layer structure for the laser diode (p-i-n junction) and reference undoped 10-layer QDs. Here, both samples include In 0.12 -Ga 0.88 As strain-reducing layers (SRLs) [33][34][35] and GaAs 0.72 -P 0.28 strain-compensation layers (SCLs).…”
Section: Methodsmentioning
confidence: 99%
“…Other gallium sources have been investigated, such as isopropyl gallium [80,81] and gallane (Ga 2 H 6 ) based adduct compounds [82][83][84]. The adduct compounds stabilize the gallane from rapid decomposition at room temperature.…”
Section: Gallium Sourcesmentioning
confidence: 99%